Patents Assigned to PEI Company
  • Patent number: 8410439
    Abstract: Multiple detectors arranged in a ring within a specimen chamber provide a large solid angle of collection. The detectors preferably include a shutter and a cold shield that reduce ice formation on the detector. By providing detectors surrounding the sample, a large solid angle is provided for improved detection and x-rays are detected regardless of the direction of sample tilt.
    Type: Grant
    Filed: December 6, 2011
    Date of Patent: April 2, 2013
    Assignee: PEI Company
    Inventors: Hanno Sebastian Von Harrach, Bert Freitag, Pleun Dona
  • Patent number: 7150811
    Abstract: A charged particle beam apparatus and method for locally removing material from a predetermined location on a workpiece, such as the removal of a metallization layer covering an alignment mark on a wafer. The invention is particularly suited for high-volume mass production of semiconductor chips or electromechanical devices. According to one embodiment of the invention, a layer of material covering an alignment mark on a wafer is removed by ion beam sputtering using a non-LMIS beam directed at an oblique angle to the sample surface.
    Type: Grant
    Filed: September 24, 2003
    Date of Patent: December 19, 2006
    Assignee: PEI Company
    Inventor: Brian Miller