Abstract: Thermal management arrangements for analysis systems including a plasma source such as inductively-coupled-plasma are disclosed. An analysis system may include a plasma source configured to a plasma source configured to receive and ionize a sample to create an ionized sample, and an instrument such as a mass spectrometer or optical emission spectrometer configured to receive and analyze the ionized sample. A heat shield may be positioned between the plasma source and the instrument, and the heat shield may be constructed and arranged to direct heated gas and/or plasma from the plasma source away from the instrument. In some instances, the heated gas and/or plasma may be extracted from a chamber containing the plasma source.

Abstract: Thermal management arrangements for analysis systems including a plasma source such as inductively-coupled-plasma are disclosed. An analysis system may include a plasma source configured to a plasma source configured to receive and ionize a sample to create an ionized sample, and an instrument such as a mass spectrometer or optical emission spectrometer configured to receive and analyze the ionized sample. A heat shield may be positioned between the plasma source and the instrument, and the heat shield may be constructed and arranged to direct heated gas and/or plasma from the plasma source away from the instrument. In some instances, the heated gas and/or plasma may be extracted from a chamber containing the plasma source.

Abstract: A device for mass spectroscopy comprising a chamber configured to provide an atomization source, a boost device configured to provide radio frequency energy to the chamber, and a mass analyzer in fluid communication with the chamber and configured to separate species based on mass-to-charge ratios is disclosed. In certain examples, a boost device may be used with a flame or plasma to provide additional energy to a flame or plasma to enhance desolvation, atomization, and/or ionization.

Abstract: A substrate handling system and method in which an air chuck produces a film of air between the substrate and the air chuck, a magnetic chuck attracts the substrate to the air chuck, and an actuator subsystem moves the magnetic chuck closer to and away from the air chuck to alternately pick up a substrate and release the substrate.

Abstract: Shorting bars are provided for electrostatic discharge protection as a portion of trace deposition in a photodiode array. During normal processing for etching of the metal layers, the shorting bars are removed without additional processing requirements. Additional shorting elements are provided by employing FET silicon layers having traces in contact with the array traces to provide extended ESD protection until removal of those shorting elements during normal processing for opening vias for photodiode bottom contact.

Abstract: A short arc lamp incorporates a cylindrical reflector body having a reflector cavity opening to a first end and an anode aperture through a base surface at a second end. The body has a step at the second end. A front sleeve with a step for positional engagement of a land is received over the first end of the reflector body. A cathode support is received within the second end of the front sleeve and includes a ring to engage a second oppositely oriented positioning step. A window mount received within the second end of the front sleeve abuts a front surface of the ring. A highly conductive base concentrically supporting an anode received through the anode aperture has a flange in flush abutment with the base surface for braze attachment.

Abstract: Shorting bars are provided for electrostatic discharge protection as a portion of trace deposition in a photodiode array. During normal processing for etching of the metal layers, the shorting bars are removed without additional processing requirements. Additional shorting elements are provided by employing FET silicon layers having traces in contact with the array traces to provide extended ESD protection until removal of those shorting elements during normal processing for opening vias for photodiode bottom contact.

Abstract: Shorting bars are provided for electrostatic discharge protection as a portion of trace deposition in a photodiode array. During normal processing for etching of the metal layers, the shorting bars are removed without additional processing requirements. Additional shorting elements are provided by employing FET silicon layers having traces in contact with the array traces to provide extended ESD protection until removal of those shorting elements during normal processing for opening vias for photodiode bottom contact.

Abstract: Plasma devices and methods for using such plasma devices in analytical measurements are disclosed. In certain examples, a low flow plasma may be operative using a total argon gas flow of less than about five liters per minute, and in some embodiments, a plasma argon gas flow of less than about four liter per minute. In other examples, a plasma produced using inductive and capacitive coupling is disclosed.

Abstract: A method and apparatus for eliminating artifacts in images formed using more than one image segment. A buffer region associated with two adjacent image segments is defined wherein the intensity levels of the pixels are attenuated. When image segments substantially overlap in the buffer region, the intensity in the buffer region substantially sums to full scale. The intensity of the pixels in the buffer region is preferably attenuated using a device to modulate the intensity of the source of radiation.

Abstract: A boost device configured to provide additional energy to an atomization source, such as a flame or plasma, is disclosed. In certain examples, a boost device may be used with a flame or plasma to provide additional energy to the flame or plasma to enhance desolvation, atomization, and/or ionization. In other examples, the boost device may be configured to provide additional energy for excitation of species. Instruments and devices including at least one boost device are also disclosed.

Abstract: A device for optical emission spectroscopy comprising a chamber comprising an atomization source, at least one boost device configured with a radio frequency source to provide radio frequency energy to the chamber, and an optical detector configured to detect optical emission of species in the chamber is provided. In certain examples, a boost device may be used with a flame or plasma to provide additional energy to a flame or plasma to enhance desolvation, atomization, and/or ionization. In other examples, the boost device may be configured to provide additional energy for excitation of species.

Abstract: A pressure-energized, annular metallic seal is provided that includes a central annular portion and a pair of annular leg portions extending from the central portion. Each leg portion includes a convex sealing surface lying in sealing plane. One of the leg portions preferably has an annular flange offset from its sealing plane in an axial direction towards the sealing plane of the other leg portion. One of the leg portions preferably has at least one radially extending tab projecting further than adjacent parts of the seal. The seal is preferably manufactured by first cutting a first annular edge in a metallic sheet material, then bending the sheet material substantially into the shape of the seal, and then cutting a second annular edge to complete the shape of the seal. The second annular edge preferably defines the annular flange and/or the at least one tab.

Abstract: A rotary seal assembly including a first member having a sealing face and a second member having a sealing face with a number of pumping grooves therein. At least a first set of pumping grooves stating proximate a center portion of the sealing face and extending outward and at least a second set of pumping grooves starting proximate the center portion of the sealing face and extending inward to direct fluid fed to the center portion of the sealing face simultaneously both inwardly and outwardly from the center portion of the sealing face to provide a uniform fluid film thickness between the sealing faces of the first and second members when one sealing face cones due to thermal and/or pressure effects.

Abstract: A metallic seal is provided that concentrates the available load over a narrow band to produce a sealing dam over a sufficient width to minimize leakage on a molecular level. The metallic seal has a first annular end section with has a first annular sealing surface, a second annular end section with a second annular sealing surface and an annular center section extending between the first and second annular end sections to form a ring having a central passageway with a center longitudinal axis. The third annular section is frustoconical tube with the first and second annular end sections being contiguously arranged at opposite ends of the annular center section such that sealing loads applied substantially perpendicularly on the first and second annular sealing surfaces primarily deform due to torsional stress of the metallic seal.

Abstract: A device for sustaining a plasma in a torch is provided. In certain examples, the device comprises a first electrode configured to couple to a power source and constructed and arranged to provide a loop current along a radial plane of the torch. In some examples, the radial plane of the torch is substantially perpendicular to a longitudinal axis of the torch.

Abstract: A face seal assembly including an annular mating ring housing having a proximal end surface with a channel therein, a mating ring insert disposed in the channel, the mating ring insert including a mating ring compressed within a first band to maintain the integrity of the mating ring. An annular sealing ring housing has a distal end surface with a channel therein, and a sealing ring insert is disposed in the channel, the sealing ring insert including a sealing ring compressed within a second band to maintain the integrity of the sealing ring. The mating ring faces the sealing ring to prevent fluid from escaping therebetween. A method of making such a face seal assembly is also disclosed as is a complete face seal assembly useful in the top drive unit of an offshore drilling unit.

Abstract: There is disclosed a plating process that involves the application of a soft metallic coating, composed of substantially pure metal or alloy, to resilient metal seals utilizing a high-volume, high-energy electro-deposition plating process. The process basically includes supporting a predetermined quantity of metallic seals at non-sealing surface locations with the metallic seals disposed in series on a conveyor having a predetermined processing path, and continuously moving the seals in series through an electro-plating stage of the processing path to electro-deposit a metallic coating on the seals using a high current density and a high chemical flow rate. The seals of this process are applicable to any application or industry where a large quantity of high vacuum/high purity seals are required and where traditional electro-deposition processes would not yield a sufficient quantity of finished parts or would not produce them at an acceptable cost.

Abstract: An integrated, in-line bumping and exposure system for printing plates or other substrates having a photosensitive layer. A linear illumination source or sources are for bumping the photosensitive material with a band of illumination to consume dissolved oxygen within the photosensitive layer. A raster scan optical assembly or an illuminated and re-imaged spatial light modulator array exposes the photosensitive material with a rasterized beam or beams or an array of modulated electromagnetic radiation located downstream of the bumping illumination. A conveyance mechanism is configured to provide relative continuous motion between one or more substrates and the bands of illumination to continuously bump and pattern one portion of the plate or plates while the other portion of the plate or plates is bumped in anticipation of patterning.

Abstract: A metallic seal is provided that concentrates the available load over a narrow band to produce a sealing dam over a sufficient width to minimize leakage on a molecular level. The metallic seal has a first annular beam section, a second annular beam section, and inner and outer surfaces extending between the first and second annular beam sections. One of the inner and outer surfaces has an annular recess that at least partially defines an annular column section of material extending substantially perpendicular between said first and second annular beam sections thereto. The first annular beam section has a first non-sealing surface and a first raised portion with a first annular sealing surface facing in a first axial direction to contact a first member for creating a first annular sealing dam therebetween.