Patents Assigned to Persys Technology Ltd.
  • Patent number: 9752975
    Abstract: Determining cleanliness of a sample by providing a continuous flow of clean air into a chamber through a HEPA filter, taking a reference reading of particle counts while the chamber is empty, introducing the sample into the chamber and taking a first reading of a particle count received from all sides of the sample in the chamber to determine loose particles in a particle size range of 0.1 microns up to 5 microns associated with the sample.
    Type: Grant
    Filed: January 10, 2016
    Date of Patent: September 5, 2017
    Assignee: PERSYS TECHNOLOGY LTD.
    Inventors: Leo Mendelovici, Gideon Drimer, Yitzhak Vanek
  • Patent number: 9746409
    Abstract: A method and apparatus for determining cleanliness of a sample is provided. The method includes taking a first reading of particles count of a sample placed into a chamber. The method further includes directing a stream of air over the sample, and taking a second reading of particles count of the sample. The method further includes calculating a difference between the first reading and the second reading, and determining a cleanliness of the sample based upon the difference. The method further includes option of taking an additional reading while a stream of ionized air is directed towards the sample. The method further includes trapping the impurities particles released from the sample by applying a vacuum through the filter, and analyzing the trapped particles to determine nature and chemical composition of the impurities particles.
    Type: Grant
    Filed: July 11, 2013
    Date of Patent: August 29, 2017
    Assignee: PERSYS TECHNOLOGY LTD.
    Inventors: Yitzhak Vanek, Leo Mendelovici, Gideon Drimer
  • Patent number: 6179609
    Abstract: A compact torch for use in semiconductor processing which may be used both to produce steam and to perform wet or dry dichlorethylene (DCE) oxidation at varying concentrations with no reconfiguration of the torch, providing full temperature of control of the oxidation product gases, with redundancy to provide automatic backup of heating and ignition elements, and with non-mechanical flow control of the oxidation product gases.
    Type: Grant
    Filed: July 2, 1999
    Date of Patent: January 30, 2001
    Assignee: Persys Technology Ltd.
    Inventors: Gideon Drimer, Leo Mendelovici, Nachum Borivker
  • Patent number: 6157003
    Abstract: A furnace for processing semiconductor wafers including an insulating enclosure; a first heating apparatus disposed centrally with respect to the insulating enclosure; a frame operative to support a multiplicity of semiconductor wafers in a nearly vertical orientation in at least one right polyhedronal tier about and facing the first centrally disposed heating apparatus; a double-walled quartz enclosure for enclosing the wafers which is operative to enable the wafers to be processed in a predetermined controlled environment; and a second heating apparatus disposed between the quartz enclosure and the insulating enclosure arranged, together with the first heating apparatus, for substantially uniform heating of the wafers.
    Type: Grant
    Filed: October 27, 1998
    Date of Patent: December 5, 2000
    Assignee: Persys Technology, Ltd.
    Inventor: Gideon Drimer
  • Patent number: 5338424
    Abstract: A mask and an assembly utilizable in the production of a multiplicity of capacitors on selected regions of a semiconductor wafer includes a shaped, thin sheet of material having spaced-apart holes made therein and at least one recess formed adjacent each of at least two opposite edges thereof, the recess being configured to be engaged by a substantially matching portion of a clamp releasably affixing the mask onto the wafer.
    Type: Grant
    Filed: December 29, 1992
    Date of Patent: August 16, 1994
    Assignee: Persys Technology Ltd.
    Inventors: Gideon Drimer, Arie Glazer