Patents Assigned to Phase Shift Technology, Inc.
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Patent number: 6885461Abstract: A system and method are provided for obtaining mapping profiles of transparent objects having a plurality of reflective surfaces. The object, the surfaces of which are to be mapped, is placed in an unequal path interferometer including a reference surface located a predetermined distance from the object. Coherent light is supplied in the interferometer from a tunable source; and multiple optical interferograms for each of the plurality of reflective surfaces are simultaneously recorded. These interferograms are simultaneously extracted through the use of a dynamically generated weighted least-square fitting technique; which separates interferograms from a set of superimposed interferograms to obtain a given interferogram for any one of the surfaces, free from errors resulting from the existence of the other interferograms.Type: GrantFiled: December 3, 2002Date of Patent: April 26, 2005Assignee: Phase Shift Technology, Inc.Inventor: Shouhong Tang
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Patent number: 6856405Abstract: A method and apparatus to linearize the phase shifts produced by the wavelength-varying driving mechanism of an interferometer used in phase shift interferometry for the measurement of multiple reflective surfaces first calibrates a sequence of physical values used as the input to the driving mechanism to produce a known linear or a known constant phase shift increment between any two adjacent interferograms. The calibration process, in essence, involves the determination of the sequence of physical values, such as the voltage change with respect to the time, through the process of iteration. This sequence then is used as an input to the phase shift driving mechanism for ongoing operation of the system, thereby compensating for non-linear characteristics of the system.Type: GrantFiled: March 3, 2003Date of Patent: February 15, 2005Assignee: Phase Shift Technology, Inc.Inventor: Shouhong Tang
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Patent number: 6847458Abstract: The present invention consists of a technique and device for measuring the thickness variation and shape of wafers or other polished opaque plates. A combination of two improved phase-shifting Fizeau interferometers is used to simultaneously measure the single-sided distance maps between each side of the wafer and the corresponding reference flat, with the thickness variation and shape being calculated from these data. Provisions are made to determine and eliminate the shape and tilt of the reference surfaces, and also to facilitate the correct overlay of the two single-sided measurements for the calculation of thickness variation and shape.Type: GrantFiled: March 20, 2003Date of Patent: January 25, 2005Assignee: Phase Shift Technology, Inc.Inventors: Klaus Freischlad, Shouhong Tang
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Publication number: 20040201843Abstract: A device is disclosed for supporting semiconductor wafers or other polished, opaque plates for processing or metrology in a vertical orientation, where the wafer loading and unloading occurs in a horizontal orientation. The device consists of a pallet designed with an opening such that both sides of the wafer are exposed. The wafer is loaded into the pallet to rest on three fixed rest members extending a short distance into the opening. Moving clamp members on the frame are located for movement toward or away from the corresponding rest members. Two cylindrical rest pins are located on axes parallel to the central axis of the opening to permit the wafer to rest under the force of gravity on the rest pins when the frame is rotated to its vertical position. Special provisions are made to minimize the effects of mechanical vibration of the wafer while insuring a robust physical restraint of the wafer within the apparatus without inducing mechanical stresses which could influence the shape of the wafer.Type: ApplicationFiled: April 9, 2003Publication date: October 14, 2004Applicants: Phase Shift Technology, Inc., dba ADE Phase Shift, Inc.Inventors: Joe M. Glenn, Clive M. Pridmore, Bryan G. Castner, Klaus Freischlad
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Publication number: 20040184038Abstract: The present invention consists of a technique and device for measuring the thickness variation and shape of wafers or other polished opaque plates. A combination of two improved phase-shifting Fizeau interferometers is used to simultaneously measure the single-sided distance maps between each side of the wafer and the corresponding reference flat, with the thickness variation and shape being calculated from these data. Provisions are made to determine and eliminate the shape and tilt of the reference surfaces, and also to facilitate the correct overlay of the two single-sided measurements for the calculation of thickness variation and shape.Type: ApplicationFiled: March 20, 2003Publication date: September 23, 2004Applicant: Phase Shift Technology, Inc.Inventors: Klaus Freischlad, Shouhong Tang
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Publication number: 20040174526Abstract: A method and apparatus to linearize the phase shifts produced by the wavelength-varying driving mechanism of an interferometer used in phase shift interferometry for the measurement of multiple reflective surfaces first calibrates a sequence of physical values used as the input to the driving mechanism to produce a known linear or a known constant phase shift increment between any two adjacent interferograms. The calibration process, in essence, involves the determination of the sequence of physical values, such as the voltage change with respect to the time, through the process of iteration. This sequence then is used as an input to the phase shift driving mechanism for ongoing operation of the system, thereby compensating for non-linear characteristics of the system.Type: ApplicationFiled: March 3, 2003Publication date: September 9, 2004Applicant: Phase Shift Technology, Inc.Inventor: Shouhong Tang
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Patent number: 5737081Abstract: An interferometer particularly suitable for testing the flatness of transparent plano-parallel test pieces employs an extended spatially non-coherent light source. The source is directed to a first beam splitter at an angle of incidence other than normal; and the beam is split into first and second spatially non-coherent divergent wavefronts. A reference surface reflects the first wavefront and a surface under test reflects the second wavefront. A second beam splitter receives and recombines the first and second reflected spatially non-coherent wavefronts; and an interference detector is located to receive the combined reflected wavefronts to produce the interferogram. The distance traveled by the wavefronts from the first beam splitter to the detector is equal, and the optical characteristics of the light path traveled by both wavefronts is the same.Type: GrantFiled: December 6, 1996Date of Patent: April 7, 1998Assignee: Phase Shift Technology, Inc.Inventor: Klaus R. Freischlad
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Patent number: 5471307Abstract: A sheet flatness measuring system consists of a frame carrying a structured illumination system for producing illumination beneath the frame in a periodic pattern of opaque and illuminated lines. A flat base or table, having a surface parallel to the structured illumination system, is placed beneath the structured illumination system to be illuminated by it. A sheet of reflective or semi-reflective material, the flatness of which is to be measured, is placed on the table. The reflection of the structured illumination is viewed from the sheet a by video camera, typically mounted in a central location above the center of the table on which the sheet is placed. The structured illumination pattern is moved to different positions, and multiple video images are digitized and compared in a computer to calculate the local slope at each point or pixel in the image of the sheet viewed by the camera.Type: GrantFiled: September 21, 1992Date of Patent: November 28, 1995Assignee: Phase Shift Technology, Inc.Inventors: Chris L. Koliopoulos, Shouhong Tang