Abstract: A method for generating extreme ultraviolet radiation and soft x-ray radiation with a gas discharge operated on the left branch of the Paschen curve, in particular, for EUV lithography, wherein a discharge chamber (10) of a predetermined gas pressure and two electrodes (11, 12) are used, wherein the electrodes have an opening (14, 15), respectively, positioned on the same symmetry axis (13) and, in the course of a voltage increase (16) upon reaching a predetermined ignition voltage (Uz), generate a plasma (17) located in the area between their openings (14, 15), which plasma is a source of the radiation (17?) to be generated, wherein an ignition of the plasma (17) is realized by affecting the gas pressure and/or by triggering, and wherein, with the ignition of the plasma (17), an energy storage device supplies by means of the electrodes (11, 12) stored energy into the plasma (17), characterized in that the ignition of the plasma (17) is realized by using a predetermined ignition delay (18).

Abstract: In a method for generating extreme ultraviolet radiation or soft x-ray radiation by means of gas discharge, in particular, for EUV lithography, a discharge vessel is provided with two electrodes that are connected to high voltage. Between the electrodes, in an area of two electrode recesses that are coaxial to one another, a gas fill with predetermined gas pressure in accordance with a discharge operation realized on the left branch of the Paschen curve is provided. In this area, a plasma emitting the radiation is generated when supplying energy. The plasma is displaced or deformed by a pressure change of the gas fill in the area of the electrode recesses.