Patents Assigned to PHILIPS CORPORATION and ASM LITHOGRAPHY B.V.
  • Publication number: 20010053489
    Abstract: Aberrations of an imaging system (PL) can be detected in an accurate and reliable way by imaging, by means of the imaging system, a circular phase structure (22) on a photoresist (PR), developing the resist and scanning it with a scanning detection device (SEM) which is coupled to an image processor (IP). The circular phase structure is imaged in a ring structure (25) and each type of aberration, like coma, astigmatism, three-point aberration, etc. causes a specific change in the shape of the inner contour (CI) and the outer contour (CE) of the ring and/or a change in the distance between these contours, so that the aberrations can be detected independently of each other. Each type of aberration is represented by a specific Fourier harmonic (Z−), which is composed of Zernike coefficients (Z−), each representing a specific lower or higher order sub-aberration.
    Type: Application
    Filed: June 12, 2001
    Publication date: December 20, 2001
    Applicant: PHILIPS CORPORATION and ASM LITHOGRAPHY B.V.
    Inventors: Peter Dirksen, Casparus A.H. Juffermans