Abstract: A Taiko wafer ring cut process method is provided. The Taiko wafer ring cut process method includes the following steps. A Taiko wafer is disposed on the platform. The Taiko wafer is performing by laser ring cutting so that a Taiko ring and an edge portion of the Taiko wafer are separated from a wafer portion of the Taiko wafer. The wafer portion of the Taiko wafer is adhered to a frame.
Type:
Grant
Filed:
January 15, 2021
Date of Patent:
January 10, 2023
Assignee:
PHOENIX SILICON INTERNATIONAL CORP.
Inventors:
Chien-Hsiung Huang, Chao-Tsung Tsou, Cheng-Yen Lin
Abstract: A manufacturing process of wafer thinning includes a step of wafer-grinding to grind a surface of a wafer to a first predetermined thickness, and a step of wafer-etching to etch the grinded face of the wafer with the first predetermined thickness to a second predetermined thickness.
Type:
Grant
Filed:
September 1, 2016
Date of Patent:
July 17, 2018
Assignee:
PHOENIX SILICON INTERNATIONAL CORP.
Inventors:
Shih-Ching Yang, Chien-Hsiung Huang, Chao-Tsung Tsou, Cheng-Yen Lin