Patents Assigned to Phoeton Corp.
  • Patent number: 8389894
    Abstract: A laser processing apparatus for processing a multitude of portions to be processed in an area to be processed in a subject W to be processed, including a laser device, a focusing or imaging device for laser beams provided by the laser device, and an arranging device for arranging the subject W to be processed, in which the subject W to be processed and the focusing or imaging device are fixed, and the subject to be processed is processed while relatively shifting the laser beams and the focusing or imaging device so that the focusing or imaging device is irradiated from different areas in the laser beam, inside and outside the area to be processed, and that cumulative laser beam irradiation time during the processing of each of the multitude of portions to be processed is equalized.
    Type: Grant
    Filed: May 16, 2006
    Date of Patent: March 5, 2013
    Assignee: Phoeton Corp.
    Inventors: Satoshi Ando, Tomobumi Muraoka, Takashi Nire, Akira Matsuno, Tadashi Kurata
  • Patent number: 7943534
    Abstract: A semiconductor device manufacturing method and a semiconductor device manufacturing system for irradiating a first laser light (50) and a second laser light (52) with a wavelength different from that of the first laser light to a substrate (46) to perform a thermal processing on the substrate are provided. In the step for performing the thermal processing, at least one of an irradiation intensity and an irradiation time of a first laser and a second laser is controlled to control a temperature distribution in the substrate or a film on the substrate in a depth direction.
    Type: Grant
    Filed: July 24, 2006
    Date of Patent: May 17, 2011
    Assignee: Phoeton Corp.
    Inventors: Akira Matsuno, Takashi Nire
  • Publication number: 20090227121
    Abstract: A semiconductor device manufacturing method and a semiconductor device manufacturing system for irradiating a first laser light (50) and a second laser light (52) with a wavelength different from that of the first laser light to a substrate (46) to perform a thermal processing on the substrate are provided. In the step for performing the thermal processing, at least one of an irradiation intensity and an irradiation time of a first laser and a second laser is controlled to control a temperature distribution in the substrate or a film on the substrate in a depth direction.
    Type: Application
    Filed: July 24, 2006
    Publication date: September 10, 2009
    Applicant: PHOETON CORP.
    Inventors: Akira Matsuno, Takashi Nire
  • Publication number: 20090032510
    Abstract: A laser processing apparatus for processing a multitude of portions to be processed in an area to be processed in a subject W to be processed, including a laser device, a focusing or imaging means for laser beams provided by the laser device, and an arranging means for arranging the subject W to be processed, in which the subject W to be processed and the focusing or imaging means are fixed, and the subject to be processed is processed while relatively shifting the laser beams and the focusing or imaging means so that the focusing or imaging means is irradiated from different areas in the laser beam, inside and outside the area to be processed, and that cumulative laser beam irradiation time during the processing of each of the multitude of portions to be processed is equalized.
    Type: Application
    Filed: May 16, 2006
    Publication date: February 5, 2009
    Applicant: PHOETON CORP.
    Inventors: Satoshi Ando, Tomobumi Muraoka, Takashi Nire, Akira Matsuno, Tadashi Kurata