Abstract: A showerhead for chemical vapor deposition includes: a plurality of reactive gas showerhead modules separated each other and having the same number as the number of kinds of reactive gases injected from the showerhead, each having a mixing zone in the reactive gas showerhead module to induce a mixing of a reactive gas and an injection support gas used to regulate the injection velocity of the reactive gas and a plurality of reactive gas injection tubes connected to the bottom surface of the reactive gas showerhead module for injecting the reactive gas mixed with the injection support gas over the substrate; and a purge gas showerhead module mounted under the reactive gas showerhead modules, with a purge gas supply port for supplying a purge gas to the purge gas showerhead module.
Type:
Grant
Filed:
September 18, 2014
Date of Patent:
October 25, 2016
Assignees:
PIEZONICS Co., Ltd., Korea Institute of Industrial Technology
Abstract: Disclosed is an apparatus for chemical vapor deposition (CVD) with a showerhead through which a source material gas is injected over a substrate to deposit a film on the substrate.
Abstract: Disclosed is a piezoelectric ink jet printer head in which a chamber and an ink storage are integrally formed. A process for manufacturing the ink jet printer head is also disclosed.
Type:
Grant
Filed:
May 11, 2004
Date of Patent:
February 10, 2009
Assignees:
Piezonics Co., Ltd., Korea Institute of Industrial Technology
Inventors:
Young June Cho, Chul Soo Byun, Moon Soo Park, Kyung Tae Kang, Young Seok Choi, Il Yong Chung, Jaichan Lee
Abstract: Disclosed therein is a method of chemical vapor deposition (CVD) with a showerhead through which a source material gas comprising a reactive gas of at least one kind and a purge gas is injected over a substrate to deposit a film on the substrate, including the steps of: disposing the showerhead in such a way that the bottom surface of the showerhead is spaced apart from the substrate by a predetermined distance; supplying a source material gas into the showerhead, wherein reactive gases of different kinds are respectively injected into compartments formed inside the showerhead in such a way that each compartment of the showerhead is filled with the reactive gas of only one kind and a purge gas of the source material gas is supplied into another compartment formed inside the showerhead; and discharging the reactive gas and the purge gas respectively through a large number of reactive gas outlets and a large number of purge gas outlets formed on the bottom surface of the showerhead, the purge gas outlets being