Abstract: A wafer support pin lifting device includes a support plate, a slide block and a lifting pole. The support plate is for supporting multiple support pins. The slide block is slidably connected to an inner wall of a cavity so that the slide block slides relative to the cavity. The lifting pole has a first end, a second end and a third end. The first end is connected to the support plate, the second end is pivotally connected to the slide block, and the third end is connected to an actuator. With the pivotal connection between the second end of the lifting pole and the slide block, the lifting pole approaching the high position causes the support plate to be approximately horizontal, and the lifting pole approaching the low position causes the support plate to be tilted.

Abstract: The invention discloses a gas dispensing apparatus for multiple chemical resources, including: a showerhead assembly having at least two layers of board bodies and a gas mixing chamber defined at a center of the at least two layers of board bodies, and the gas mixing chamber having multiple holes defined thereon; and a pipeline assembly mounted to the showerhead assembly and having a stepped body defining at least two pipelines, the stepped body being configured to connect to the at least two layers of the board bodies to define at least two gas cavities, each of the gas cavities communicating with the corresponding one of the pipelines, each of the gas cavities communicating with the holes defined on the gas mixing chamber.

Abstract: The invention discloses a showerhead assembly including a male board with a top surface and a bottom surface and having an injector extending from the bottom surface to inject a first gas; and a female board with a top surface and a bottom surface and having a cavity formed on the top surface. The cavity is communicatively coupled to a gas outlet through which a second gas is guided toward to the outlet. The cavity is configured to receive the first gas from the male board such that the first gas and the second gas mix and then is exhausted via the gas outlet.

Abstract: This application relates to a semiconductor device for a condition-controlled radio frequency (RF) system. In an embodiment of this application, an RF detection apparatus includes: a high-pass filter (HPF), one end of which is electrically coupled to an RF loop electrode of a ceramic heater, and another end of which is grounded; a voltage measurer, connected to the HPF in parallel; and a low-pass circuit, connected to the HPF in parallel.

Abstract: A plate for supporting wafer has a top for carrying a wafer and a bottom coupled to a pedestal. The plate includes multiple heating units embedded within the plate and at least one set of grooves formed between the top and the bottom of the plate at a radial location between two of neighboring heating units to thereby enhance heat insulation among the heating units.