Patents Assigned to Pivotal Systems Corporation
  • Patent number: 11079035
    Abstract: A valve arrangement for controlling gas flow. A gas block includes a gas inlet, a gas outlet, and a gas cavity fluidly connecting the gas inlet to the gas outlet. A diaphragm is configured for controlling gas flow between the gas inlet and the gas outlet. An actuator is configured to vary the position of the diaphragm so as to control the gas flow. The actuator comprises a tubular housing; a plunger positioned inside the housing and having an actuating extension extending outside of the housing and coupled to the diaphragm, the plunger configured to be slidable inside the housing; a piezoelectric body positioned inside the plunger; and a pre-loader applying force to the plunger so as to press the plunger against the piezoelectric body.
    Type: Grant
    Filed: July 12, 2019
    Date of Patent: August 3, 2021
    Assignee: PIVOTAL SYSTEMS CORPORATION
    Inventor: Timothy R. Brown
  • Patent number: 10401202
    Abstract: An apparatus for controlling the flow of a gas, containing a controllable valve, wherein the position of the valve and the gas pressure upstream of the valve are measured and used in conjunction with a first lookup table to determine the flow rate of the gas through the valve; and a flow restrictor upstream of the controllable valve, wherein the temperature of the flow restrictor and the gas pressure upstream and downstream of the flow restrictor are measured and used in conjunction with a second lookup table to determine the flow rate of the gas through the flow restrictor.
    Type: Grant
    Filed: July 8, 2016
    Date of Patent: September 3, 2019
    Assignee: PIVOTAL SYSTEMS CORPORATION
    Inventors: Joseph R. Monkowski, James Franklin, Jiuyi Cheng, Tao Ding, Andrey Shmakov, Travis Owens
  • Patent number: 9983595
    Abstract: A method and apparatus for self-calibrating control of gas flow. The gas flow rate is initially set by controlling, to a high degree of precision, the amount of opening of a flow restriction, where the design of the apparatus containing the flow restriction lends itself to achieving high precision. The gas flow rate is then measured by a pressure rate-of-drop upstream of the flow restriction, and the amount of flow restriction opening is adjusted, if need be, to obtain exactly the desired flow.
    Type: Grant
    Filed: November 2, 2016
    Date of Patent: May 29, 2018
    Assignee: PIVOTAL SYSTEMS CORPORATION
    Inventors: Adam J. Monkowski, Jialing Chen, Tao Ding, Joseph R. Monkowski
  • Patent number: 9904297
    Abstract: A method and apparatus for self-calibrating control of gas flow. The gas flow rate is initially set by controlling, to a high degree of precision, the amount of opening of a flow restriction, where the design of the apparatus containing the flow restriction lends itself to achieving high precision. The gas flow rate is then measured by a pressure rate-of-drop upstream of the flow restriction, and the amount of flow restriction opening is adjusted, if need be, to obtain exactly the desired flow.
    Type: Grant
    Filed: September 2, 2014
    Date of Patent: February 27, 2018
    Assignee: PIVOTAL SYSTEMS CORPORATION
    Inventors: Adam J. Monkowski, Jialing Chen, Tao Ding, Joseph R. Monkowski
  • Patent number: 9523435
    Abstract: A method and apparatus for self-calibrating control of gas flow. The gas flow rate is initially set by controlling, to a high degree of precision, the amount of opening of a flow restriction, where the design of the apparatus containing the flow restriction lends itself to achieving high precision. The gas flow rate is then measured by a pressure rate-of-drop upstream of the flow restriction, and the amount of flow restriction opening is adjusted, if need be, to obtain exactly the desired flow.
    Type: Grant
    Filed: September 2, 2014
    Date of Patent: December 20, 2016
    Assignee: PIVOTAL SYSTEMS CORPORATION
    Inventors: Adam J. Monkowski, Jialing Chen, Tao Ding, Joseph R. Monkowski
  • Patent number: 9400004
    Abstract: An apparatus to measure the transient response of a mass flow controller (MFC). The size of a variable orifice, upstream of the MFC, is controlled such that the pressure between the orifice and the MFC is held constant during the entire time that the MFC is going through its transient response. The known relationship between the size of the orifice and the flow through it allows a determination of the transient response of the MFC.
    Type: Grant
    Filed: November 29, 2011
    Date of Patent: July 26, 2016
    Assignee: PIVOTAL SYSTEMS CORPORATION
    Inventors: Joseph R. Monkowski, Adam J. Monkowski, Jialing Chen, Tao Ding
  • Publication number: 20160161953
    Abstract: A system for utilizing more than one communication protocol on a single mass flow controller (MFC) device. Communication protocols include, but are not limited to, DeviceNet, RS-485, and analog. A D-Subminiature connector (D-Sub) of the MFC has a pin configuration system that is compatible between RS-485 and analog. In addition, a different connector plug is used for DeviceNet on the same MFC, eliminating the need for compatibility of pins with other communication protocols. Together, these above-mentioned configuration systems allow one MFC device to choose between more than one communication protocol.
    Type: Application
    Filed: December 3, 2014
    Publication date: June 9, 2016
    Applicant: PIVOTAL SYSTEMS CORPORATION
    Inventors: Joseph Monkowski, William Brisco, Adam Monkowski
  • Patent number: 8857456
    Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test. A pressure regulator is coupled to a gas source. The GFC is positioned downstream of the pressure regulator. A pressure transducer is measuring pressure in a volume between the pressure regulator and the GFC. Techniques are provided for increasing the pressure in the volume.
    Type: Grant
    Filed: August 13, 2012
    Date of Patent: October 14, 2014
    Assignee: Pivotal Systems Corporation
    Inventors: Joseph R. Monkowski, Jialing Chen, Tao Ding, James MacAllen Chalmers
  • Patent number: 8667830
    Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test.
    Type: Grant
    Filed: September 27, 2010
    Date of Patent: March 11, 2014
    Assignee: Pivotal Systems Corporation
    Inventors: Joseph R. Monkowski, Jialing Chen, Tao Ding, James MacAllen Chalmers
  • Patent number: 8393197
    Abstract: Embodiments of the present invention employ measurement of argon as the means to detect the presence of an atmospheric leak in a processing chamber. Argon detected inside the process chamber is conclusive evidence of a leak. Furthermore, the amount of detected argon provides information on the rate of air entering through the leak. In one embodiment, leak detection takes place in the main plasma inside the processing chamber. In another embodiment, leak detection takes place in the self-contained plasma generated in a remote plasma sensor. Additional measurements can be performed, such as measuring the amount of oxygen, and/or the presence of moisture to help in detecting and quantifying outgassing from the processing chamber.
    Type: Grant
    Filed: July 24, 2009
    Date of Patent: March 12, 2013
    Assignee: Pivotal Systems Corporation
    Inventors: Joseph R. Monkowski, Barton Lane
  • Publication number: 20120304781
    Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test. A pressure regulator is coupled to a gas source. The GFC is positioned downstream of the pressure regulator. A pressure transducer is measuring pressure in a volume between the pressure regulator and the GFC, wherein means are provided for increasing the pressure in the volume.
    Type: Application
    Filed: August 13, 2012
    Publication date: December 6, 2012
    Applicant: Pivotal Systems Corporation
    Inventors: Joseph R. MONKOWSKI, Jialing Chen, Tao Ding, James MacAllen Chalmers
  • Patent number: 8271211
    Abstract: An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.
    Type: Grant
    Filed: December 9, 2009
    Date of Patent: September 18, 2012
    Assignee: Pivotal Systems Corporation
    Inventors: Sherk Chung, James MacAllen Chalmers, Jialing Chen, Yi Wang, Paul Tran, Sophia Leonidovna Shtilman, Joseph R. Monkowski
  • Patent number: 8271210
    Abstract: An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.
    Type: Grant
    Filed: December 9, 2009
    Date of Patent: September 18, 2012
    Assignee: Pivotal Systems Corporation
    Inventors: Sherk Chung, James MacAllen Chalmers, Jialing Chen, Yi Wang, Paul Tran, Sophia Leonidovna Shtilman, Joseph R. Monkowski
  • Patent number: 8265888
    Abstract: An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.
    Type: Grant
    Filed: December 9, 2009
    Date of Patent: September 11, 2012
    Assignee: Pivotal Systems Corporation
    Inventors: Sherk Chung, James MacAllen Chalmers, Jialing Chen, Yi Wang, Paul Tran, Sophia Leonidovna Shtilman, Joseph R. Monkowski
  • Patent number: 8240324
    Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test. A pressure regulator is coupled to a gas source. The GFC is positioned downstream of the pressure regulator. A pressure transducer is measuring pressure in a volume between the pressure regulator and the GFC, wherein means are provided for increasing the pressure in the volume.
    Type: Grant
    Filed: January 16, 2009
    Date of Patent: August 14, 2012
    Assignee: Pivotal Systems Corporation
    Inventors: Joseph R. Monkowski, Jialing Chen, Tao Ding, James MacAllen Chalmers
  • Patent number: 8237928
    Abstract: Embodiments of the present invention relate to the analysis of the components of one or more gases, for example a gas mixture sampled from a semiconductor manufacturing process such as plasma etching or plasma enhanced chemical vapor deposition (PECVD). Particular embodiments provide sufficient power to a plasma of the sample, to dissociate a large number of the molecules and molecular fragments into individual atoms. With sufficient power (typically a power density of between 3-40 W/cm3) delivered into the plasma, most of the emission peaks result from emission of individual atoms, thereby creating spectra conducive to simplifying the identification of the chemical composition of the gases under investigation. Such accurate identification of components of the gas may allow for the precise determination of the stage of the process being performed, and in particular for detection of process endpoint.
    Type: Grant
    Filed: March 30, 2011
    Date of Patent: August 7, 2012
    Assignee: Pivotal Systems Corporation
    Inventors: Joseph R. Monkowski, Barton Lane
  • Publication number: 20120132291
    Abstract: An apparatus to measure the transient response of a mass flow controller (MFC). The size of a variable orifice, upstream of the MFC, is controlled such that the pressure between the orifice and the MFC is held constant during the entire time that the MFC is going through its transient response. The known relationship between the size of the orifice and the flow through it allows a determination of the transient response of the MFC.
    Type: Application
    Filed: November 29, 2011
    Publication date: May 31, 2012
    Applicant: Pivotal Systems Corporation
    Inventors: Joseph R. MONKOWSKI, Adam J. MONKOWSKI, Jialing CHEN, Tao DING
  • Patent number: 8102844
    Abstract: A method and system for intercepting and forwarding High-Speed SECS Message Services (HSMS) communication between at least two entities, includes a fail-safe bypass to ensure the communications link between the entities is not severed upon failure of the intercepting/forwarding agent. A “pass-through” agent is placed in between two entities communicating via an HSMS link, such that the pass-through agent is able to intercept messages from one entity and forward it to the other entity, and vice versa. The pass-through agent is able to see all messages between the two entities, and is also able to create HSMS messages and send them to one of the entities as if the message had come from the other entity, thereby conferring the ability to inject additional HSMS messages. Should the pass-through agent fail, a bypass mechanism ensures that the two entities can automatically resume HSMS communication without the pass-through agent.
    Type: Grant
    Filed: September 21, 2006
    Date of Patent: January 24, 2012
    Assignee: Pivotal Systems Corporation
    Inventors: Andrew Bryan Nelson, Paxton Ming Kai Chow, Vera Alexandrova Snowball, Sherk Chung, Abhijit Majumdar
  • Publication number: 20110137581
    Abstract: An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.
    Type: Application
    Filed: December 9, 2009
    Publication date: June 9, 2011
    Applicant: Pivotal Systems Corporation
    Inventors: Sherk CHUNG, James MacAllen Chalmers, Jialing Chen, Yi Wang, Paul Tran, Sophia Leonidovna Shtilman, Joseph R. Monkowski
  • Publication number: 20110137583
    Abstract: An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.
    Type: Application
    Filed: December 9, 2009
    Publication date: June 9, 2011
    Applicant: Pivotal Systems Corporation
    Inventors: Sherk CHUNG, James MacAllen CHALMERS, Jialing CHEN, Yi WANG, Paul TRAN, Sophia Leonidovna SHTILMAN, Joseph R. MONKOWSKI