Patents Assigned to Pl-Limited
  • RF/VHF plasma diamond growth method and apparatus and materials produced therein
    Patent number: 5902563
    Abstract: Processes are disclosed for performing non-microwave, non-arcjet plasma-assisted chemical vapor deposition of diamond in which substantially no particles impact the growing diamond surface with energies sufficient to prevent the growth of diamond. The energies of the particles are limited by selecting frequency, pressure, magnetic fields, electrical bias, or a combination thereof to the deposition region of the chamber. Diamond materials formed by these processes are also disclosed.
    Type: Grant
    Filed: October 30, 1997
    Date of Patent: May 11, 1999
    Assignee: Pl-Limited
    Inventor: John M. Pinneo