Abstract: A superalloy target wherein the superalloy target has a polycrystalline structure of random grain orientation, the average grain size in the structure is smaller than 20 ?m, and the porosity in the structure is smaller than 10%. Furthermore, the invention includes a method of producing a superalloy target by powder metallurgical production, wherein the powder-metallurgical production starts from alloyed powder(s) of a superalloy and includes the step of spark plasma sintering (SPS) of the alloyed powder(s).

Abstract: A target for use in a physical vapor deposition process includes a matrix composed of a composite material selected from the group consisting of aluminum-based material, titanium-based material and chromium-based material and all combinations thereof. The matrix is doped with doping elements and the doping elements are embedded as constituents of ceramic compounds or aluminum alloys in the matrix. The doping elements are selected from the group of the lanthanides: La, Ce, Nb, Sm and Eu. A process for producing such a target and a use of such a target in a physical vapor deposition process are also provided.

Abstract: A vacuum arc source for arc evaporation of boride includes: a cathode made of at least 90 at-% of boride, in particular made of more than 98 at-% of boride; an anode, which is preferably in the shape of a disk; a body made of a material which is less preferred by arc discharge compared to the cathode, the body surrounding the cathode in such a way that during operation of the vacuum arc source, movement of an arc on an arc surface of the cathode is limited by the body. At least 90 at-% of the material of the anode is of the same chemical composition as the cathode.

Abstract: A target includes a target plate and a stabilizing layer which is joined to the rear side of the target plate. The stabilizing layer was produced by high-kinetic-energy spraying of stabilizing material onto the target plate. A process for producing a target is also provided.

Abstract: The present invention relates to a conductive target material comprising essentially one lithium compound, preferably lithium phosphate, and carbon, and also typical impurities. The invention further relates to a process for producing a conductive target material and to the use thereof.

Abstract: A process for producing a hard material layer on a substrate. A multilayer coating system is applied to the substrate by alternate deposition of CrTaN and AlTiN by way of physical vapor deposition (PVD). The CrTaN and/or the AlTiN are preferably deposited from a composite target.

Abstract: A process for producing a coating source for physical vapour deposition provides the coating source with a target layer formed of an at least two-phase composite which contains a metallic phase and at least one further phase and a mechanical stabilizing layer which is joined to the target layer on one side of the target layer. A first powder mixture which corresponds in terms of its composition to the at least two-phase composite and a second powder mixture which corresponds in terms of its composition to the mechanical stabilizing layer are densified hot in superposed layers. A coating source for physical vapour deposition is also provided.

Abstract: A coating source for physical vapor deposition to produce doped carbon layers. The coating source is produced by way of sintering from pulverulent components and is formed of carbon as matrix material in a proportion of at least 75 mol % and at least one dopant in a proportion in the range from 1 mol % to 25 mol %.

Abstract: A cathode-electrolyte-anode unit for an electrochemical functional device, in particular a high-temperature fuel cell. The unit has a multi-layer solid-state electrolyte arranged between a porous anode and a porous cathode. The solid-state electrolyte is produced by a vapor deposition process and has a sandwich-type structure consisting of at least one first layer with a lower oxygen content, and at least one second layer with a higher oxygen content. The individual layers have substantially the same composition, with the exception of oxygen.

Abstract: A target, in particular a sputtering target, includes a target plate of a brittle material and a back plate. The back plate is connected to the target plate over an area and the target plate has micro cracks which pass through from the front side to the rear side of the target plate and divide the target plate into adjacent fragments. A process is also provided for producing such a target which is suitable, in particular, for the use of extremely high power densities. A vacuum coating process uses at least one such target as a sputtering target and as a result particularly high power densities can be used on the target during the sputtering.