Abstract: A powder-metallurgical sintered molybdenum part which is present as a solid body has the following composition: a molybdenum content of ?99.93% by weight, a boron content “B” of ?3 ppmw and a carbon content “C” of ?3 ppmw, with a total content “BaC” of carbon and boron being in a range of 15 ppmw?“BaC”?50 ppmw, an oxygen content “O” in a range of 3 ppmw?“O”?20 ppmw, a maximum tungsten content of ?330 ppmw and a maximum proportion of other impurities of ?300 ppmw. A powder-metallurgical process for producing such a sintered molybdenum part is also provided.

Abstract: An electrically conductive, oxidic target material includes a proportion of substoichiometric molybdenum oxide phases of at least 60% by volume, an MoO2 phase in a proportion of 2-20% by volume, and optionally an MoO3 phase in a proportion of 0-20% by volume. The substoichiometric molybdenum oxide phase proportion is formed by one or more substoichiometric MoO3-y phase(s), where y is in each case in a range from 0.05 to 0.25. A process for producing the target material and a process for using the target material are also provided.

Abstract: A process for producing a W—Ni sputtering target includes providing the sputtering target with 45 to 75 wt % W and a remainder of Ni and common impurities. The sputtering target contains a Ni(W) phase, a W phase and no or less than 10% by area on average of intermetallic phases measured at a target material cross section.

Abstract: A component includes a multiplicity of individual powder particles of Mo, a Mo-based alloy, W or a W-based alloy that have been fused together to give a solid structure by a high-energy beam via an additive manufacturing method. The component has an oxygen content of not more than 0.1 at %. An additive manufacturing method includes producing the powder via the melt phase and providing a carbon content in the region of not less than 0.15 at %. The components are crack-free and have high grain boundary strength.

Abstract: A sputtering target containing molybdenum and at least one metal from the group tantalum and niobium. The average content of tantalum and/or niobium is from 5 to 15 at % and the molybdenum content is greater than or equal to 80 at %. The sputtering target has at least a matrix with an average molybdenum content of greater than or equal to 92 at % and particles which are composed of a solid solution containing at least one metal from the group of tantalum and niobium, and molybdenum, with an average molybdenum content of greater than or equal to 15 at % and are embedded in the matrix. There is also described a method of producing a sputtering target.

Abstract: A high-temperature component of a refractory metal or a refractory metal alloy has an emissivity-increasing coating. The coating is formed of tantalum nitride and/or zirconium nitride; and tungsten with a tungsten content between 0 and 98 wt. %.

Abstract: A target for a cathode sputtering system has a tubular target body made of a sputtering material and at least one connector piece, which is connected to the target body and projects from the target body, for attaching the target body to the cathode sputtering system. The target body is connected to the at least one connector piece in a vacuum-tight manner and the two are rotationally fixed relative to one another. At least one damper element is provided between the at least one connector piece and the target body.

Abstract: A cathode material for use in a high-pressure discharge lamp contains a matrix based on tungsten having a tungsten content of greater than or equal to 95% by weight, tungsten carbide, and oxides and/or predominantly oxidic phases of one or more emitter elements from the group of rare earth metals, Hf, and Zr. The cathode material additionally contains predominantly carbidic phases of the one or more emitter elements from the group of rare earth metals, Hf, and Zr. A high-pressure discharge lamp would contain such a cathode composed of the above cathode material.

Abstract: A metal powder has a chromium content of at least 90 Ma %, a nanohardness according to EN ISO 14577-1 of ?4 GPa and/or a green strength measured according to ASTM B312-09 of at least 7 MPa at a compression pressure of 550 MPa.

Abstract: A target includes a target plate and a stabilizing layer which is joined to the rear side of the target plate. The stabilizing layer was produced by high-kinetic-energy spraying of stabilizing material onto the target plate. A process for producing a target is also provided.

Abstract: The present invention relates to a conductive target material comprising essentially one lithium compound, preferably lithium phosphate, and carbon, and also typical impurities. The invention further relates to a process for producing a conductive target material and to the use thereof.

Abstract: A process for producing a glass melting component composed of refractory metal. A surface zone of the glass melting component is densified at least in sections by application of local compressive stress. As a result the surface zone has its porosity reduced compared to a volume section which is located underneath the surface zone and which has residual porosity.

Abstract: A slinger, or slinger ring, for a melt spinning apparatus has a cylindrical, mechanically shaped main element that is composed of a refractory metal or a refractory metal-based alloy and has a circumferential surface running in a tangential direction. The circumferential surface is delimited in the axial direction by two end faces. A degree of deformation in the radial direction is greater than the degree of deformation in the axial direction.

Abstract: A metallization for a thin-film component includes at least one layer composed of an Mo-based alloy containing Al and Ti and usual impurities. A process for producing a metallization includes providing at least one sputtering target, depositing at least one layer of an Mo-based alloy containing Al and Ti and usual impurities, and structuring the metallization by using at least one photolithographic process and at least one subsequent etching step. A sputtering target is composed of an Mo-based alloy containing Al and Ti and usual impurities. A process for producing a sputtering target composed of an Mo-based alloy includes providing a powder mixture containing Mo and also Al and Ti and cold gas spraying (CGS) of the powder mixture onto a suitable support material.

Abstract: A tubular target for cathode atomization does not have a backing tube and it is made of molybdenum or a molybdenum alloy. The target has an inner surface which is in contact at least in certain regions with a cooling medium, wherein at least one region of the inner surface is separated from the cooling medium by at least one protective device. By way of example, the protective device may be in the form of a polymer layer. The tubular target exhibits outstanding long-term stability.

Abstract: A connection piece for a tubular target which has a cylindrical inner surface and a cylindrical outer surface and at least one magnetic insert. The position of the magnetic insert is adjustable along the axial direction of the connection piece on at least an inner surface or outer surface of the connection piece.

Abstract: A crucible includes a wall made of a base material of tungsten or molybdenum or of a material based on tungsten or molybdenum. A barrier layer is disposed at least in sections on an outer side of the wall and/or in the wall. The barrier layer is made of a metallic material having a greater affinity for carbon and/or oxygen than the base material. A method for using a crucible for producing single-crystal sapphire or fused quartz and a method for producing a crucible for high-temperature applications are also provided.

Abstract: A coating material has Cr-rich regions having a Cr content >95% by mass which form Cr-containing particles. At least some of these particles are present in the form of aggregates or agglomerates, at least some have pores and have in the Cr-rich regions a mean nanohardness HIT 0.005/5/1/5 of ?4 GPa and/or a mean surface area, measured by BET, >0.05 m2/g. The coating material is particularly suitable for cold gas spraying. There is also described a process for the production of a coating, and to a coating produced by the process.

Abstract: A membrane assembly for the permeative separation of a fluid from fluid mixtures includes a porous, fluid-permeable, metallic support substrate, a membrane that is disposed on the support substrate and is selectively permeable to the fluid to be separated off, and a connecting part which is formed, at least on the surface, of a fluid-tight, metallic material. The support substrate is cohesively bonded along a peripheral section thereof to the connecting part. A ceramic, fluid-permeable, porous, first intermediate layer is disposed between the support substrate and the membrane. At least one ceramic bonding layer is disposed directly on the connecting part and the material bond and extends at least over the cohesive material bond and an adjoining section of the connecting part. The first intermediate layer ends on the bonding layer and has a greater average pore size than the bonding layer.

Abstract: A container includes at least two interconnected parts which are connected to one another at least in some regions by a thermally sprayed layer. At least one part is formed of a refractory metal or a refractory metal alloy. The container makes it possible to provide great variety, both with regard to form and dimensions of the container, which is impermeable to ceramic melts even under high operating temperatures. A method for producing a container is also provided.