Patents Assigned to Plasma Processes, LLC
  • Patent number: 11390960
    Abstract: A structure which is resistant to corrosion at high temperatures comprises a layer of ruthenium and/or ruthenium alloy and a layer of a refractory metal having a high strength at high temperatures, such as rhenium. Further, the structure may include a layer of ceramic such as zirconia or hafnia on the exposed face of the ruthenium layer. Alternative embodiments of the present invention include a catalyst formed from a low strength support structure with a first metal layer and a second ruthenium catalytic layer on top of the first metal layer. Another alternative embodiment of the present invention includes the formation of high purity ruthenium electrodes that are resistant to corrosion at high temperatures.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: July 19, 2022
    Assignee: Plasma Processes, LLC
    Inventors: Timothy N. McKechnie, Anatoliy Shchetkovskiy
  • Patent number: 10106902
    Abstract: This invention provides an electrolyte salt for use in an electrodeposition process for depositing Zirconium metal on a thin foil substrate. The prior art electrochemical process causes a reaction between a uranium substrate and ZrF4 species in the electrolyte that causes the formation of UFx at the substrate surface that prevents the formation of a dense uniform zirconium coating. This problem is solved by using an electrolyte salt in an electrodeposition process consisting of lithium fluoride (LiF) in a concentration ranging between about 11.5 molar percent and about 61 molar percent and one or more salts selected from the group consisting of sodium fluoride (NaF), potassium fluoride (KF), cesium fluoride (CsF), or cesium chloride (CsCL). Zirconium is added to the electrolyte salt through an addition of zirconium fluoride (ZrF4) in the range of about 1 to about 5 mass percent (w/w %). The Zr coating is of at least 98% pure Zr with a density of at least 98%.
    Type: Grant
    Filed: March 21, 2017
    Date of Patent: October 23, 2018
    Assignee: Plasma Processes, LLC
    Inventors: Alexander Smirnov, Scott O'Dell, Anatoliy Shchetkovskiy