Abstract: The invention relates to a plasma technique, and can be used for generation of beams of charged particles, for instance, ions, in technological goals and in the space electric propulsion installations. Gas discharge device comprises an axially symmetric chamber with at least one face wall, a HF power input unit and a magnetic system providing the generation of stationary non-uniform magnetic field inside the chamber. The induction of magnetic field decreases not only in the radial direction towards the chamber axis of symmetry but also in the longitudinal direction towards the face part of the chamber opposite to the area of HF power input unit arrangement. The invention is characterized in that the HF power input unit is fabricated as conductor of zigzag recurrent symmetric shape and is located on the lateral and face walls of the chamber comprising the region of plasma generation and in that the horizontal size of the chamber exceeds its longitudinal size.
Type:
Grant
Filed:
June 7, 1999
Date of Patent:
March 21, 2000
Assignee:
Plasma Tech Co., Ltd.
Inventors:
Tatijana Borisovna Antonova, Gleb Elmirovich Bougrov, Sergey Gennadievich Kondranin, Elena Alexandrovna Kralkina, Vladimir Borisovich Pavlov, Andrej Fedorovich Alexandrov, Anri Amvrosievich Rukhadze