Abstract: The electrostatic chuck comprises a chuck base for supporting a wafer, a dielectric film mounted on the chuck base, the dielectric film having an electrode for supplying direct current voltage to provide an electrostatic force to fix the wafer, the electrode disposed in the dielectric film, and a cooling channel for supplying refrigerant to the dielectric film to control the temperature of the wafer.

Abstract: Disclosed is plasma etching method and apparatus for manufacturing a semiconductor device. The plasma etching apparatus includes a chamber in which a wafer to be etched is loaded, at least one CCD, at least one gas supply unit for supplying etching gases into the chamber; and at least one state control unit. The state control unit comprises a light component extractor, a estimator, a comparator, a controller, and a timer. The plasma etching apparatus also comprises a chamber in which a wafer to be etched is loaded; a first dome sealing an upper end of the chamber; a coil winded on the dome and generation electric field into the chamber; at least one light emission tip disposed through a predetermined portion of the dome, so as to emit light toward the wafer and receive light reflected by the wafer; and a plurality of nozzles, each of which is disposed around light emission tip and through the, predetermined portion of the dome, so as to supply gases into the chamber.

Abstract: Municipal or other solid waste is delivered in loose form to a processing facility where it is compacted into a supply chute adjacent the upper portion of a reactor. The compaction serves to remove most of the air and some of the water from the waste as well as to seal the reactor against air infiltration. The supply chute is equipped with a number of pusher units which are capable of pushing a portion of the compacted waste in the form of a block into the reactor. The blocks of compacted waste are deposited in the top of the reactor in response to a signal related to the height of waste in the reactor. A pivotally and extendible mounted plasma arc torch is employed as a heat source to pyrolyze organic waste components to generate desired by-product gases. Air and steam are added in controlled quantities to improve the operational efficiency and the by-product gas composition. Residual materials which do not pyrolyze are melted and cooled into a substantially inert vitrified mass.

Abstract: A system is disclosed in which municipal mixed solid waste is delivered to a processing facility where it is compacted before being placed into a reactor. The compaction apparatus serves to remove most of the air and some of the water from the waste as well as to seal the reactor against air infiltration. A transfer apparatus, in response to a signal relating to the height of waste in the reactor, sequentially deposits blocks of compacted waste in the top of the reactor when the height is low. The reactor has a pivotally and extensively mounted plasma arc torch as a heat source which is effective to pyrolyze organic waste components to generate desired by-product gases. Air and steam are added in controlled quantities to improve the operational efficiency and the by-product gas composition. The residual materials which do not pyrolyze are melted and cooled into a substantially inert vitrified mass.

Abstract: The present invention provides an apparatus for the melting and subsequent solidification of fine particulate material by means of a plasma torch. The fine particulate material is introduced into a furnace having a plasma torch to a depth sufficient to cover the plasma flame produced by the torch. When operative, the torch generates a heat at low gas flow, which both allows the fine particulate material to rest with little disturbance and to transfer large amounts of heat energy to the fine particulate, effectively preheating the fine particulate material for more efficient melting. The melt may, for example, be solidified into a block for building use, into fibers by means of pressurized air passed through a venturi nozzle or into other useful forms.