Abstract: A plasma processing apparatus includes a toroidal-shape plasma vessel comprising a process chamber. A magnetic core surrounds a portion of the toroidal-shape plasma vessel. An RF power supply having an output that is electrically connected to the magnetic core energizes the magnetic core, thereby forming a toroidal plasma loop discharge in the plasma chamber. A workpiece holder is positioned in the toroidal-shape plasma vessel and includes at least one face. A plasma guiding structure is shaped and dimensioned so as to constrain a section of plasma in the toroidal plasma loop to travel substantially perpendicular to a normal to the at least one face.

Abstract: A manufacturing equipment digital interface includes a shared Small Computer Standard Interface (SCSI) connector that is electrically connected to a manufacturing equipment SCSI bus. A plurality of SCSI-to-target-memory bridges is electrically connected to the shared SCSI connector. The plurality of SCSI-to-target-memory bridges interfaces the shared SCSI connector to a plurality of target memory devices. A drive controller includes a memory buffer that provides temporary storage of the information being transferred from the manufacturing equipment SCSI bus to the plurality of target memory devices. Also, the drive controller includes a SCSI-to-target-memory bridge arbitrator that controls the transfers of information from the manufacturing equipment SCSI bus to the target memory device. A network interface is electrically connected to the drive controller.

Abstract: A method of CVD plasma processing for depositing at least one of diamond, diamond-like-carbon, or graphene comprising includes forming a vacuum chamber comprising a first toroidal plasma source comprising a conduit and a magnetic core, a second toroidal plasma source comprising a conduit and a magnetic core, and a process chamber that is common to both the first and second toroidal plasma source. Gas is introduced into the vacuum chamber. A first RF electromagnetic field is applied to the magnetic core surrounding the conduit of the first toroidal plasma source to form a first toroidal plasma loop discharge in the vacuum chamber. A second RF electromagnetic field is applied to the magnetic core surrounding the conduit of the second toroidal plasma source to form a second toroidal plasma loop discharge in the vacuum chamber. A workpiece is positioned in the process chamber for plasma processing at a distance from a hot plasma core to a surface of the workpiece that is in a range from 0.1 cm to 5 cm.

Abstract: A method of CVD plasma processing for depositing at least one of diamond, diamond-like-carbon, or graphene includes forming a vacuum chamber comprising a conduit and a process chamber. A gas is introduced into the vacuum chamber. An RF electromagnetic field is applied to a magnetic core to form a toroidal plasma loop discharge in the vacuum chamber. A workpiece is positioned in the process chamber for plasma processing at a distance from a hot plasma core to a surface of the workpiece that is in a range from 0.1 cm to 5 cm. A gas comprising hydrogen is introduced to the workpiece so that the toroidal plasma loop discharge generates atomic hydrogen.

Abstract: A plasma processing apparatus including a vacuum chamber comprising a conduit, a process chamber, and a first gas input port for introducing gas into the vacuum chamber, and a pump port for evacuating gas from the vacuum chamber. A magnetic core surrounds the conduit. An output of an RF power supply is electrically connected to the magnetic core. The RF power supply energizes the magnetic core, thereby forming a toroidal plasma loop discharge in the vacuum chamber. A platen that supports a workpiece during plasma processing is positioned in the process chamber.

Abstract: A manufacturing equipment digital interface includes a shared Small Computer Standard Interface (SCSI) connector that is electrically connected to a manufacturing equipment SCSI bus. A plurality of SCSI-to-target-memory bridges is electrically connected to the shared SCSI connector. The plurality of SCSI-to-target-memory bridges interfaces the shared SCSI connector to a plurality of target memory devices. A drive controller includes a memory buffer that provides temporary storage of the information being transferred from the manufacturing equipment SCSI bus to the plurality of target memory devices. Also, the drive controller includes a SCSI-to-target-memory bridge arbitrator that controls the transfers of information from the manufacturing equipment SCSI bus to the target memory device. A network interface is electrically connected to the drive controller.

Abstract: A plasma processing apparatus includes a toroidal-shape plasma vessel comprising a process chamber. A magnetic core surrounds a portion of the toroidal-shape plasma vessel. An RF power supply having an output that is electrically connected to the magnetic core energizes the magnetic core, thereby forming a toroidal plasma loop discharge in the plasma chamber. A workpiece holder is positioned in the toroidal-shape plasma vessel and includes at least one face. A plasma guiding structure is shaped and dimensioned so as to constrain a section of plasma in the toroidal plasma loop to travel substantially perpendicular to a normal to the at least one face.

Abstract: A CRT light pen emulating interface with power save and remote access for flat panel displays includes a pen flat panel display that indicates at least one of a user action with a light pen switch or other device and a presence of a light pen emulating object positioned on or proximate to a display surface of the electromagnetic pen flat panel display. A light pen emulating object is positioned proximate to the electromagnetic pen flat panel display. A processor generates a light pen emulation signal comprising position data for the light pen emulating object relative to the display surface of the electromagnetic flat panel display. A light pen CRT electronic interface converts the position data for the light pen emulating object into a corresponding signal that is comparable to a signal generated by a CRT light pen viewing a scanning dot on the CRT screen.

Abstract: A CRT light pen emulating interface with power save and remote access for flat panel displays includes a pen flat panel display that indicates at least one of a user action with a light pen switch or other device and a presence of a light pen emulating object positioned on or proximate to a display surface of the electromagnetic pen flat panel display. A light pen emulating object is positioned proximate to the electromagnetic pen flat panel display. A processor generates a light pen emulation signal comprising position data for the light pen emulating object relative to the display surface of the electromagnetic flat panel display. A light pen CRT electronic interface converts the position data for the light pen emulating object into a corresponding signal that is comparable to a signal generated by a CRT light pen viewing a scanning dot on the CRT screen.

Abstract: A CRT light pen emulating interface with power save and remote access for flat panel displays includes a pen flat panel display that indicates at least one of a user action with a light pen switch or other device and a presence of a light pen emulating object positioned on or proximate to a display surface of the electromagnetic pen flat panel display. A light pen emulating object is positioned proximate to the electromagnetic pen flat panel display. A processor generates a light pen emulation signal comprising position data for the light pen emulating object relative to the display surface of the electromagnetic flat panel display. A light pen CRT electronic interface converts the position data for the light pen emulating object into a corresponding signal that is comparable to a signal generated by a CRT light pen viewing a scanning dot on the CRT screen.

Abstract: A plasma processing apparatus including a vacuum chamber comprising a conduit, a process chamber, and a first gas input port for introducing gas into the vacuum chamber, and a pump port for evacuating gas from the vacuum chamber. A magnetic core surrounds the conduit. An output of an RF power supply is electrically connected to the magnetic core. The RF power supply energizes the magnetic core, thereby forming a toroidal plasma loop discharge in the vacuum chamber. A platen that supports a workpiece during plasma processing is positioned in the process chamber.

Abstract: A CRT light pen emulating interface with power save and remote access for flat panel displays includes a pen flat panel display that indicates at least one of a user action with a light pen switch or other device and a presence of a light pen emulating object positioned on or proximate to a display surface of the electromagnetic pen flat panel display. A light pen emulating object is positioned proximate to the electromagnetic pen flat panel display. A processor generates a light pen emulation signal comprising position data for the light pen emulating object relative to the display surface of the electromagnetic flat panel display. A light pen CRT electronic interface converts the position data for the light pen emulating object into a corresponding signal that is comparable to a signal generated by a CRT light pen viewing a scanning dot on the CRT screen.