Abstract: A method of growing single crystal diamond assisted by polycrystalline diamond growth to enhance dimensions and quality of the single crystal diamond includes thermally mating a diamond seed on a top surface of a substrate holder providing a growth surface for a combination of single crystal diamond and polycrystalline diamond. A predetermined temperature difference between the diamond seed and the substrate holder during processing along with the plasma process conditions causes a single crystal diamond growth rate to be different from a polycrystalline growth rate by a predetermined amount. Process gasses are introduced, and a plasma is formed to grow both single crystal diamond and polycrystalline diamond on the growth surface so that the polycrystalline diamond grown adjacent to the single crystal diamond shields side surfaces of the growing single crystal diamond, thereby improving growth quality across the growing single crystal diamond.

Abstract: A method of growing single crystal diamond assisted by polycrystalline diamond growth to enhance dimensions and quality of the single crystal diamond includes thermally mating a diamond seed on a top surface of a substrate holder providing a growth surface for a combination of single crystal diamond and polycrystalline diamond. A predetermined temperature difference between the diamond seed and the substrate holder during processing along with the plasma process conditions causes a single crystal diamond growth rate to be different from a polycrystalline growth rate by a predetermined amount. Process gasses are introduced, and a plasma is formed to grow both single crystal diamond and polycrystalline diamond on the growth surface so that the polycrystalline diamond grown adjacent to the single crystal diamond shields side surfaces of the growing single crystal diamond, thereby improving growth quality across the growing single crystal diamond.

Abstract: A method of growing personalized single crystal diamond includes providing a seed diamond material. Diamond is grown on the seed diamond material to a mass of greater than 0.1 gram with an initial finished surface. A process gas is provided that contains at least some carbon from a deceased or living being or inanimate object. A thin film of diamond is grown on top of the initial finished surface to form a second finished surface by using chemical vapor deposition with the process gas.

Abstract: A plasma chemical vapor deposition system for growing diamond and diamond-like materials includes a process chamber having an exhaust port that is coupled to an input of a vacuum pump. A plasma generator generates a plasma in the process chamber. A cooling stage is positioned in the process chamber with a substrate holder positioned on a top surface that is configured to mount one or more substrates so they are exposed to the plasma generated by the plasma generator. The substrate holder defines a plenum having one or more portions. One or more pressure controllers are each configured to control a pressure in one of the first and second portion of the plenum so as to control a relative temperature of adjacent portions of the substrate holder.

Abstract: A method of growing single crystal diamond assisted by polycrystalline diamond growth to enhance dimensions and quality of the single crystal diamond includes thermally mating a diamond seed on a top surface of a substrate holder providing a growth surface for a combination of single crystal diamond and polycrystalline diamond. A predetermined temperature difference between the diamond seed and the substrate holder during processing along with the plasma process conditions causes a single crystal diamond growth rate to be different from a polycrystalline growth rate by a predetermined amount. Process gasses are introduced, and a plasma is formed to grow both single crystal diamond and polycrystalline diamond on the growth surface so that the polycrystalline diamond grown adjacent to the single crystal diamond shields side surfaces of the growing single crystal diamond, thereby improving growth quality across the growing single crystal diamond.

Abstract: A method of growing single crystal diamond assisted by polycrystalline diamond growth to enhance dimensions and quality of the single crystal diamond includes thermally mating a diamond seed on a top surface of a substrate holder providing a growth surface for a combination of single crystal diamond and polycrystalline diamond. A predetermined temperature difference between the diamond seed and the substrate holder during processing along with the plasma process conditions causes a single crystal diamond growth rate to be different from a polycrystalline growth rate by a predetermined amount. Process gasses are introduced, and a plasma is formed to grow both single crystal diamond and polycrystalline diamond on the growth surface so that the polycrystalline diamond grown adjacent to the single crystal diamond shields side surfaces of the growing single crystal diamond, thereby improving growth quality across the growing single crystal diamond.

Abstract: A plasma processing apparatus includes a toroidal-shape plasma vessel comprising a process chamber. A magnetic core surrounds a portion of the toroidal-shape plasma vessel. An RF power supply having an output that is electrically connected to the magnetic core energizes the magnetic core, thereby forming a toroidal plasma loop discharge in the plasma chamber. A workpiece holder is positioned in the toroidal-shape plasma vessel and includes at least one face. A plasma guiding structure is shaped and dimensioned so as to constrain a section of plasma in the toroidal plasma loop to travel substantially perpendicular to a normal to the at least one face.

Abstract: A plasma processing apparatus includes a toroidal-shape plasma vessel comprising a process chamber. A magnetic core surrounds a portion of the toroidal-shape plasma vessel. An RF power supply having an output that is electrically connected to the magnetic core energizes the magnetic core, thereby forming a toroidal plasma loop discharge in the plasma chamber. A workpiece holder is positioned in the toroidal-shape plasma vessel and includes at least one face. A plasma guiding structure is shaped and dimensioned so as to constrain a section of plasma in the toroidal plasma loop to travel substantially perpendicular to a normal to the at least one face.

Abstract: A plasma processing apparatus includes a toroidal-shape plasma vessel comprising a process chamber. A magnetic core surrounds a portion of the toroidal-shape plasma vessel. An RF power supply having an output that is electrically connected to the magnetic core energizes the magnetic core, thereby forming a toroidal plasma loop discharge in the plasma chamber. A workpiece holder is positioned in the toroidal-shape plasma vessel and includes at least one face. A plasma guiding structure is shaped and dimensioned so as to constrain a section of plasma in the toroidal plasma loop to travel substantially perpendicular to a normal to the at least one face.

Abstract: A manufacturing equipment digital interface includes a shared Small Computer Standard Interface (SCSI) connector that is electrically connected to a manufacturing equipment SCSI bus. A plurality of SCSI-to-target-memory bridges is electrically connected to the shared SCSI connector. The plurality of SCSI-to-target-memory bridges interfaces the shared SCSI connector to a plurality of target memory devices. A drive controller includes a memory buffer that provides temporary storage of the information being transferred from the manufacturing equipment SCSI bus to the plurality of target memory devices. Also, the drive controller includes a SCSI-to-target-memory bridge arbitrator that controls the transfers of information from the manufacturing equipment SCSI bus to the target memory device. A network interface is electrically connected to the drive controller.

Abstract: A method of CVD plasma processing for depositing at least one of diamond, diamond-like-carbon, or graphene comprising includes forming a vacuum chamber comprising a first toroidal plasma source comprising a conduit and a magnetic core, a second toroidal plasma source comprising a conduit and a magnetic core, and a process chamber that is common to both the first and second toroidal plasma source. Gas is introduced into the vacuum chamber. A first RF electromagnetic field is applied to the magnetic core surrounding the conduit of the first toroidal plasma source to form a first toroidal plasma loop discharge in the vacuum chamber. A second RF electromagnetic field is applied to the magnetic core surrounding the conduit of the second toroidal plasma source to form a second toroidal plasma loop discharge in the vacuum chamber. A workpiece is positioned in the process chamber for plasma processing at a distance from a hot plasma core to a surface of the workpiece that is in a range from 0.1 cm to 5 cm.

Abstract: A method of CVD plasma processing for depositing at least one of diamond, diamond-like-carbon, or graphene includes forming a vacuum chamber comprising a conduit and a process chamber. A gas is introduced into the vacuum chamber. An RF electromagnetic field is applied to a magnetic core to form a toroidal plasma loop discharge in the vacuum chamber. A workpiece is positioned in the process chamber for plasma processing at a distance from a hot plasma core to a surface of the workpiece that is in a range from 0.1 cm to 5 cm. A gas comprising hydrogen is introduced to the workpiece so that the toroidal plasma loop discharge generates atomic hydrogen.

Abstract: A plasma processing apparatus including a vacuum chamber comprising a conduit, a process chamber, and a first gas input port for introducing gas into the vacuum chamber, and a pump port for evacuating gas from the vacuum chamber. A magnetic core surrounds the conduit. An output of an RF power supply is electrically connected to the magnetic core. The RF power supply energizes the magnetic core, thereby forming a toroidal plasma loop discharge in the vacuum chamber. A platen that supports a workpiece during plasma processing is positioned in the process chamber.

Abstract: A manufacturing equipment digital interface includes a shared Small Computer Standard Interface (SCSI) connector that is electrically connected to a manufacturing equipment SCSI bus. A plurality of SCSI-to-target-memory bridges is electrically connected to the shared SCSI connector. The plurality of SCSI-to-target-memory bridges interfaces the shared SCSI connector to a plurality of target memory devices. A drive controller includes a memory buffer that provides temporary storage of the information being transferred from the manufacturing equipment SCSI bus to the plurality of target memory devices. Also, the drive controller includes a SCSI-to-target-memory bridge arbitrator that controls the transfers of information from the manufacturing equipment SCSI bus to the target memory device. A network interface is electrically connected to the drive controller.

Abstract: A plasma processing apparatus includes a toroidal-shape plasma vessel comprising a process chamber. A magnetic core surrounds a portion of the toroidal-shape plasma vessel. An RF power supply having an output that is electrically connected to the magnetic core energizes the magnetic core, thereby forming a toroidal plasma loop discharge in the plasma chamber. A workpiece holder is positioned in the toroidal-shape plasma vessel and includes at least one face. A plasma guiding structure is shaped and dimensioned so as to constrain a section of plasma in the toroidal plasma loop to travel substantially perpendicular to a normal to the at least one face.

Abstract: A CRT light pen emulating interface with power save and remote access for flat panel displays includes a pen flat panel display that indicates at least one of a user action with a light pen switch or other device and a presence of a light pen emulating object positioned on or proximate to a display surface of the electromagnetic pen flat panel display. A light pen emulating object is positioned proximate to the electromagnetic pen flat panel display. A processor generates a light pen emulation signal comprising position data for the light pen emulating object relative to the display surface of the electromagnetic flat panel display. A light pen CRT electronic interface converts the position data for the light pen emulating object into a corresponding signal that is comparable to a signal generated by a CRT light pen viewing a scanning dot on the CRT screen.

Abstract: A CRT light pen emulating interface with power save and remote access for flat panel displays includes a pen flat panel display that indicates at least one of a user action with a light pen switch or other device and a presence of a light pen emulating object positioned on or proximate to a display surface of the electromagnetic pen flat panel display. A light pen emulating object is positioned proximate to the electromagnetic pen flat panel display. A processor generates a light pen emulation signal comprising position data for the light pen emulating object relative to the display surface of the electromagnetic flat panel display. A light pen CRT electronic interface converts the position data for the light pen emulating object into a corresponding signal that is comparable to a signal generated by a CRT light pen viewing a scanning dot on the CRT screen.

Abstract: A CRT light pen emulating interface with power save and remote access for flat panel displays includes a pen flat panel display that indicates at least one of a user action with a light pen switch or other device and a presence of a light pen emulating object positioned on or proximate to a display surface of the electromagnetic pen flat panel display. A light pen emulating object is positioned proximate to the electromagnetic pen flat panel display. A processor generates a light pen emulation signal comprising position data for the light pen emulating object relative to the display surface of the electromagnetic flat panel display. A light pen CRT electronic interface converts the position data for the light pen emulating object into a corresponding signal that is comparable to a signal generated by a CRT light pen viewing a scanning dot on the CRT screen.

Abstract: A plasma processing apparatus including a vacuum chamber comprising a conduit, a process chamber, and a first gas input port for introducing gas into the vacuum chamber, and a pump port for evacuating gas from the vacuum chamber. A magnetic core surrounds the conduit. An output of an RF power supply is electrically connected to the magnetic core. The RF power supply energizes the magnetic core, thereby forming a toroidal plasma loop discharge in the vacuum chamber. A platen that supports a workpiece during plasma processing is positioned in the process chamber.

Abstract: A CRT light pen emulating interface with power save and remote access for flat panel displays includes a pen flat panel display that indicates at least one of a user action with a light pen switch or other device and a presence of a light pen emulating object positioned on or proximate to a display surface of the electromagnetic pen flat panel display. A light pen emulating object is positioned proximate to the electromagnetic pen flat panel display. A processor generates a light pen emulation signal comprising position data for the light pen emulating object relative to the display surface of the electromagnetic flat panel display. A light pen CRT electronic interface converts the position data for the light pen emulating object into a corresponding signal that is comparable to a signal generated by a CRT light pen viewing a scanning dot on the CRT screen.