Patents Assigned to Plasmadvance AB
  • Plasma sputtering process for producing particles
    Patent number: 9447493
    Abstract: A high production rate plasma sputtering process for producing particles having a size of 10 ?m or less is disclosed. The process causes ionization of at least a part of the sputtered target atoms and is performed at such parameters that the pick-up probability of ionized sputtered target atoms on the surface of grains is high.
    Type: Grant
    Filed: February 22, 2011
    Date of Patent: September 20, 2016
    Assignee: Plasmadvance AB
    Inventors: Ulf Helmersson, Nils Brenning, Daniel Soderstrom