Abstract: A method for fabricating a ferroelectric tunnel junction, comprising growing a hafnium zirconium oxide film barrier layer by sputtering in the presence of oxygen at a temperature of at most 425° C., on a conductive material as a bottom electrode, and depositing a conductive material as a top electrode.
Type:
Grant
Filed:
June 22, 2017
Date of Patent:
August 21, 2018
Assignees:
INSTITUT NATIONAL DE LA RECHERCHE SCIENTIFIQUE, PLASMIONIQUE INC.