Abstract: Two methods are presented in order to properly compensate the changes of the optical characteristics, which are caused by the optical path length change. First, a path length compensation method in which the additional optical path length, equivalent to the dicing kerf width of the substrate, is added onto the diced-to-be waveguide part of the AWG chip during the waveguide design process and fabrication process so that the compensated optical path length is maintained even after dicing. In addition, a position compensation method is provided in which an additional waveguide is added at the position shifted by a distance equivalent to the kerf width of the substrate such that the additional waveguide undergoes the minimized path length change after dicing is performed.
Type:
Grant
Filed:
February 27, 2007
Date of Patent:
June 21, 2011
Assignee:
POINTek Inc.
Inventors:
Tae Hyung Rhee, Tae Hun Kim, Hyung Jae Lee, Byong Gwon You
Abstract: Two methods are presented in order to properly compensate the changes of the optical characteristics, which are caused by the optical path length change. First, a path length compensation method in which the additional optical path length, equivalent to the dicing kerf width of the substrate, is added onto the diced-to-be waveguide part of the AWG chip during the waveguide design process and fabrication process so that the compensated optical path length is maintained even after dicing. In addition, a position compensation method is provided in which an additional waveguide is added at the position shifted by a distance equivalent to the kerf width of the substrate such that the additional waveguide undergoes the minimized path length change after dicing is performed.
Type:
Application
Filed:
February 27, 2007
Publication date:
October 22, 2009
Applicant:
POINTEK INC.
Inventors:
Tae Hyung Rhee, Tae Hun Kim, Hyung Jae Lee, Byong Gwon You