Abstract: A method of fabricating a flash memory is provided. The method includes forming a tunneling insulating film, a charge storage film, and a blocking insulating film on a semiconductor substrate; performing High Temperature (HT) anneal for the resultant semiconductor substrate; and performing Low Temperature (LT) wet vapor anneal for the resultant semiconductor substrate.
Type:
Grant
Filed:
January 28, 2008
Date of Patent:
May 5, 2009
Assignee:
Poongsan Microtec Co., Ltd.
Inventors:
Hyun-Sang Hwang, Ho-Kyung Park, Man Jang, Min-Seok Jo
Abstract: A method of fabricating a flash memory is provided. The method includes forming a tunneling insulating film, a charge storage film, and a blocking insulating film on a semiconductor substrate; performing High Temperature (HT) anneal for the resultant semiconductor substrate; and performing Low Temperature (LT) wet vapor anneal for the resultant semiconductor substrate.