Abstract: An emission measuring system and method provide an accurate, real-time calculation of a particular material emitted from an emission source. Specifically, a CEM system installed in an industrial stack can include a dilution probe located in the stack and a data analyzer that records and analyzes characteristic data of the materials sampled by the dilution probe. A dilution ratio is used to correct for the addition of dilution gas into the stack gas sample to determine the concentration of a particular material that is being emitted from the stack. The dilution ratio is based on a molar flow rate, which can be determined by using specific algorithms and measurements.
Type:
Grant
Filed:
April 30, 2001
Date of Patent:
March 2, 2004
Assignee:
PPL Electric Utilities Corp.
Inventors:
James P. Batug, Carlos E. Romero, Ali Yilmaz, Edward K. Levy, Noel Moyer
Abstract: An emission measuring system and method provide an accurate, real-time calculation of a particular material emitted from an emission source. Specifically, a CEM system installed in an industrial stack can include a dilution probe located in the stack and a data analyzer that records and analyzes characteristic data of the materials sampled by the dilution probe. A dilution ratio is used to correct for the addition of dilution gas into the stack gas sample to determine the concentration of a particular material that is being emitted from the stack. The dilution ratio is based on a molar flow rate, which can be determined by using specific algorithms and measurements.
Type:
Application
Filed:
April 30, 2001
Publication date:
May 16, 2002
Applicant:
PPL Electric Utilities Corp.
Inventors:
James P. Batug, Carlos E. Romero, Ali Yilmaz, Edward K. Levy, Noel Moyer