Abstract: An apparatus for washing and rinsing a titration plate having a plurality of cavities includes a treatment station for supporting and retaining a titration plate to be washed and rinsed. A washing plate has a lower surface and is positioned above the treatment station. A titration plate to be washed and rinsed is supplied to the treatment station below the washing plate, with the cavities of the titration plate directed upwardly. The lower surface of the washing plate and the upper surface of the titration plate are brought into sealing contact. A plurality of nozzles are at the lower surface of the washing plate and extend into respective cavities of the titration plate. The washing plate has formed therein a plurality of bores surrounding respective nozzles, thereby defining respective annular gaps. At least one discharge channel is formed in the washing plate and is connected to the annular gaps.