Abstract: A detection pattern unit includes an inner pattern group, and an outer pattern group that includes two sets of positioning detection patterns, each set including two lines of patterns. For each set, a pitch dimension between adjacent two patterns in one line of the set is the same as a pitch dimension between adjacent two patterns in the other lines of the set. The outer pattern group further includes, for each of two different directions, two connecting lines each extending along the direction and each interconnecting two of the positioning detection patterns respectively from the two lines of a corresponding one of the sets of positioning detection patterns.