Abstract: The present disclosure relates to a process for forming a refined metal-containing unit by reducing yield impurities with acidified deionized water. Another embodiment is a composition comprising the refined metal-containing unit. Yet another embodiment is a process for forming a patterned substrate by depositing a composition comprising the refined metal-containing unit on a substrate, drying the film comprising the refined metal-containing unit, exposing the film comprising the refined metal-containing composition to a source of actinic radiation, and transferring the pattern to substrate. The disclosed embodiments are useful in producing patterned substrates by direct or indirect pattern transfer from films comprising the refined metal-containing unit.

Abstract: The present disclosure relates to a process for forming a refined metal-containing unit by reducing yield impurities with acidified deionized water. Another embodiment is a composition comprising the refined metal-containing unit. Yet another embodiment is a process for forming a patterned substrate by depositing a composition comprising the refined metal-containing unit on a substrate, drying the film comprising the refined metal-containing unit, exposing the film comprising the refined metal-containing composition to a source of actinic radiation, and transferring the pattern to substrate. The disclosed embodiments are useful in producing patterned substrates by direct or indirect pattern transfer from films comprising the refined metal-containing unit.

Abstract: The present invention relates to a process for forming metal-containing films by applying a photosensitive metal-containing composition on a substrate, drying the photosensitive metal-containing composition, exposing the photosensitive metal-containing composition to a source of actinic radiation and applying a post-treatment to the metal-containing composition. The process also includes exposing the photosensitive metal-containing composition to a source of actinic radiation through a mask or mold and developing the unexposed portion of the composition. Another embodiment of the invention is a metal-containing film, three-dimensional object or article formed by the process. The invention is useful in producing a directly patterned metal-containing film and a microdevice.

Abstract: The present invention relates to a process for forming metal-containing films by applying a photosensitive metal-containing composition on a substrate, drying the photosensitive metal-containing composition, exposing the photosensitive metal-containing composition to a source of actinic radiation and applying a post-treatment to the metal-containing composition. The process also includes exposing the photosensitive metal-containing composition to a source of actinic radiation through a mask or mold and developing the unexposed portion of the composition. Another embodiment of the invention is a metal-containing film, three-dimensional object or article formed by the process. The invention is useful in producing a directly patterned metal-containing film and a microdevice.

Abstract: The present invention relates to metal-containing compositions comprising a metal-containing precursor unit (MU), a prepolymer unit (PU), and a catalyst or an initiator capable of inducing a combining reaction of ethylenically unsaturated groups of the metal-containing precursor unit and the prepolymer unit. In another embodiment, the composition comprises MU and a catalyst or initiator capable of inducing a combining reaction of the metal-containing precursor units. Both MU and PU contain additional functional groups, which may be selected to impart compatibility with each other and to produce optically clear films. The metal-containing compositions can be used to produce films or articles having a transmittance of at least 90% and index of refraction in the range of 1.4 to 1.8 in the 400-700 nm range of light and 1.4 to 2.4 in the 150-400 nm range of light.

Abstract: The present invention relates to metal-containing compositions comprising a metal-containing precursor unit (MU), a prepolymer unit (PU), and a catalyst or an initiator capable of inducing a combining reaction of ethylenically unsaturated groups of the metal-containing precursor unit and the prepolymer unit. In another embodiment, the composition comprises MU and a catalyst or initiator capable of inducing a combining reaction of the metal-containing precursor units. Both MU and PU contain additional functional groups, which may be selected to impart compatibility with each other and to produce optically clear films. The metal-containing compositions can be used to produce films or articles having a transmittance of at least 90% and index of refraction in the range of 1.4 to 1.8 in the 400-700 nm range of light and 1.4 to 2.4 in the 150-400 nm range of light.

Abstract: The present invention relates to metal-containing compositions with refractive indices of at least 1.5 comprising a metal-containing precursor unit (MU), a prepolymer unit (PU), and a catalyst or an initiator capable of inducing a combining reaction of ethylenically unsaturated functional groups of the metal-containing precursor unit and reactive functional groups of the prepolymer unit. In another embodiment, the composition comprises MU and a catalyst or initiator capable of inducing a combining reaction of the metal-containing precursor units. Both MU and PU contain additional functional groups, which may be selected to impart compatibility with each other and to produce optically clear films. The metal-containing compositions can be used to produce films or articles having a transmittance of at least 90% and index of refraction in the range of 1.5 to 1.8 in the 400-700 nm range of light and 1.5 to 2.4 in the 150-400 nm range of light.