Abstract: Disclosed is a detection device which includes a measurement unit including an illumination sensor that measures an amount of light in an interior of a chamber, and a detection unit that detects whether plasma is generated in the interior of the chamber, through analysis of the amount of the light.
Abstract: Disclosed is a detection device which includes a measurement unit including an illumination sensor that measures an amount of light in an interior of a chamber, and a detection unit that detects whether plasma is generated in the interior of the chamber, through analysis of the amount of the light.
Abstract: Disclosed is a substrate processing apparatus that includes an interference member for minimizing a collision between a descending flow of gas supplied by a fan unit and a gas flow directed toward a transfer space from the inside of a container.
Type:
Grant
Filed:
August 30, 2019
Date of Patent:
March 30, 2021
Assignees:
PSK INC., PSK HOLDINGS INC.
Inventors:
Je Hyeok Ryu, Jae Kyeong Yoo, Jung-Hyun Kang