Abstract: A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference sensor to scan the wafer, generate contact potential difference data and processing that data to identify a pattern characteristic of the defect or contamination.
Type:
Application
Filed:
February 3, 2004
Publication date:
December 2, 2004
Applicant:
QCEPT TECHNOLOGIES, INC.
Inventors:
M. Brandon Steele, Jeffrey Alan Hawthorne, Chunho Kim, David C. Sowell
Abstract: A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference sensor to scan the wafer, generate contact potential difference data and processing that data to identify a pattern characteristic of the defect or contamination.
Type:
Application
Filed:
July 29, 2003
Publication date:
August 5, 2004
Applicant:
QCEPT TECHNOLOGIES
Inventors:
M. Brandon Steele, Jeffrey Alan Hawthorne