Abstract: The present invention provides a method of simultaneously recycling plastics and detoxifying chromite ore processing residue with residual heat from a steel slag. By heating and gasifying plastics with steel slag, followed by catalytically split-decomposing the plastics with catalysts such as chromite ore processing residue, the plastics are thoroughly converted into a energy gas under water vapor gasification. The surface coking of Chromite Ore Processing Residue is avoided. Meanwhile, the energy gas reduces Cr6+ in Chromite Ore Processing Residue into Cr3+, and the energy gas is cooled, and CO2 and Cl in the energy gas are adsorbed by alkaline substances in Chromite Ore Processing Residue. With this method, chromite ore processing residue is detoxified, and steel slag is cooled, furthermore, energy is saved and a energy gas is obtained.

Abstract: A multi-angle two-dimensional ultrasonic vibration assisted nanofluid micro-lubrication grinding device includes a workpiece fixture for clamping a workpiece and a grinding wheel for grinding the workpiece, the fixture being connected with a two-dimensional ultrasonic vibration device to maintain the sharpness of the grinding wheel cutting edge and cool the grinding temperature on the workpiece surface; a jetting mechanism used for jetting nanofluid to the workpiece is arranged on one side of the grinding wheel so as to form two-dimensional ultrasonic vibration and nanofluid micro-lubrication grinding coupling; the device applies the variable-angle two-dimensional ultrasonic vibration technology to grinding processing, and adjusts the angles of two ultrasonic vibrators to generate different combined vibration directions to change the relative movement trajectories of abrasive particles and a workpiece.

Abstract: Disclosed is a biogas residue-based in situ and ectopic coupled detoxification method for hexavalent chromium site and soil remediation agent. The method is applied to chromium-containing soil by formulating biogas residue, a carbon source and a sulfate into said soil remediation agent. Special construction and maintenance methods are adopted to achieve effective reduction of hexavalent chromium in deep contaminated soil. Therefore, the biogas residue-based in situ and ectopic coupled detoxification method for hexavalent chromium-containing sites cannot only be used to remediate chromium-containing sites deep in depth at a low cost and high efficiency, but also achieve recycled utilization of waste by treating waste with one another, thereby possessing significant value in promotion and practice.

Abstract: The present invention discloses a 3D printing apparatus and method of using a single-printhead to achieve multi-material and multi-scale printing. The apparatus comprises a base, a worktable, a wafer stage, a substrate, a power source, a printhead, and a support. The printhead is provided with a plurality of material inlets, each of which is connected to a different micro-feeding pump; and multiple materials are thoroughly mixed under the action of an agitator after being fed into the printhead, thereby achieving multi-material printing. In the present invention, a macroscopic geometrical shape of a printed object, microstructures in the interior and on the surface of the object are reasonably controlled, and integrated manufacturing of multi-scale structures is achieved.

Abstract: A bone surgery grinding experimental device capable of cooling and electrostatic atomization film formation, including a linear three-axis platform capable of moving front, back, left, right, up and down, an electric spindle and a workpiece fixing device, wherein linear three-axis platform includes an X axis structure capable of carrying out left and right movement, Y axis structure capable of carrying out front and back movement and Z axis structure capable of carrying out up and down movement, the workpiece fixing device is fixed on the Y axis structure, and electric spindle is fixed on the Z axis structure and is installed at workpiece fixing device's upper end; a grinding head is installed at the electric spindle's lower end, a grinding cooling device is arranged inside a grinding head handle or on the grinding head's surrounding, and an electrostatic atomization film formation device is arranged on the grinding head's surrounding.

Abstract: A multi-angle two-dimensional ultrasonic vibration assisted nanofluid micro-lubrication grinding device includes a workpiece fixture for clamping a workpiece and a grinding wheel for grinding the workpiece, the fixture being connected with a two-dimensional ultrasonic vibration device to maintain the sharpness of the grinding wheel cutting edge and cool the grinding temperature on the workpiece surface; a jetting mechanism used for jetting nanofluid to the workpiece is arranged on one side of the grinding wheel so as to form two-dimensional ultrasonic vibration and nanofluid micro-lubrication grinding coupling; the device applies the variable-angle two-dimensional ultrasonic vibration technology to grinding processing, and adjusts the angles of two ultrasonic vibrators to generate different combined vibration directions to change the relative movement trajectories of abrasive particles and a workpiece.

Abstract: A minimal quantity lubrication grinding device including: heat pipe grinding wheel covered with electrocaloric film material on both side surfaces, wherein external electric field is applied to outside of the electrocaloric film material; and electrostatic atomization combined nozzle provided with high-voltage DC electrostatic generator and magnetic field forming device at the outside and in an electrocaloric refrigeration and magnetically enhanced electric field; electrostatic atomization combined nozzle is respectively connected with nanoparticle liquid and gas supply system; and nanofluid is electrostatically atomized by electrostatic atomization combined nozzle and is jet to grinding area to absorb heat of grinding area; electrocaloric film material absorbs heat in grinding area through electrocaloric effect and disperses absorbed heat through heat pipe grinding wheel after leaving grinding area to form a Carnot cycle.

Abstract: A minimal quantity lubrication grinding device including: heat pipe grinding wheel covered with electrocaloric film material on both side surfaces, wherein external electric field is applied to outside of the electrocaloric film material; and electrostatic atomization combined nozzle provided with high-voltage DC electrostatic generator and magnetic field forming device at the outside and in an electrocaloric refrigeration and magnetically enhanced electric field; electrostatic atomization combined nozzle is respectively connected with nanoparticle liquid and gas supply system; and nanofluid is electrostatically atomized by electrostatic atomization combined nozzle and is jet to grinding area to absorb heat of grinding area; electrocaloric film material absorbs heat in grinding area through electrocaloric effect and disperses absorbed heat through heat pipe grinding wheel after leaving grinding area to form a Carnot cycle.

Abstract: The present invention relates to a nano fluid electrostatic atomizing controllable jet minimal lubricating for grinding system. A grinding system is provided with a corona charging nozzle, a nozzle body of the corona charging nozzle is connected with a liquid supply system and an air supply system, a high-voltage direct-current electrostatic generator at the lower part of the nozzle body is connected with the cathode of an adjustable high-voltage direct-current power supply, the anode of the adjustable high-voltage direct-current power supply is connected with a workpiece charging device, and the workpiece charging device is attached to the non-machined surface of the workpiece. Nano fluid which used as grinding liquid is fed into the corona charging nozzle through the liquid supply system, meanwhile, the air supply system feeds compressed air into the corona charging nozzle.

Abstract: The present application relates to a full wafer nanoimprint lithography device comprises a wafer stage, a full wafer coated with a liquid resist, a demolding nozzle, a composite mold, an imprint head, a pressure passageway, a vacuum passageway and a UV light source. The present application also relates to an imprinting method using the full wafer nanoimprint lithography device comprises the following steps: 1) a pretreatment process; 2) an imprinting process; 3) a curing process; and 4) a demolding process. The device and the method can be used for high volume manufacturing photonic crystal LEDs, nano patterned sapphire substrates and the like in large scale patterning on the non-planar surface or substrate.

Abstract: A method for determining a seismic design for a structure includes setting performance objectives; inputting the performance objectives into a single degree of freedom system to carry out a simulation test; continuously adjusting the size of seismic waves applied to the system to determine a relationship between performance demand and the period of the structure under different performance objectives; obtaining a seismic demand spectrum curve between a seismic influence coefficient or a spectral accelation and displacement performance objective in the single degree of freedom system; analyzing the relationship between the base shear force and the displacement of the engineering structure; converting the relationship into the relationship between the capacity and the displacement in the single degree of freedom system; obtaining a capacity spectrum curve; comparing the capacity spectrum curve with the performance demand spectrum curve; and assessing the seismic capacity of the structure under different perform

Abstract: The present application relates to a full wafer nanoimprint lithography device comprises a wafer stage, a full wafer coated with a liquid resist, a demolding nozzle, a composite mold, an imprint head, a pressure passageway, a vacuum passageway and a UV light source. The present application also relates to an imprinting method using the full wafer nanoimprint lithography device comprises the following steps: 1) a pretreatment process; 2) an imprinting process; 3) a curing process; and 4) a demolding process. The device and the method can be used for high volume manufacturing photonic crystal LEDs, nano patterned sapphire substrates and the like in large scale patterning on the non-planar surface or substrate.