Patents Assigned to Quantum Global Technologies, LLP
  • Methods and apparatus for cleaning deposition chamber parts using selective spray etch
    Patent number: 8691023
    Abstract: In one aspect, a method of cleaning an electronic device manufacturing process chamber part is provided, including a) spraying the part with an acid; b) spraying the part with DI water; and c) treating the part with potassium hydroxide. Other aspects are provided.
    Type: Grant
    Filed: August 14, 2012
    Date of Patent: April 8, 2014
    Assignee: Quantum Global Technologies, LLP
    Inventors: Liyuan Bao, Samantha S. H. Tan, Anbei Jiang