Patents Assigned to QUERTECH
  • Publication number: 20160193589
    Abstract: A method of treating a powder (P) made from cerium oxide using an ion beam (F) in which: the powder is stirred once or a plurality of times; the ions of the ion beam are selected from the ions of the elements of the list consisting of helium (He), boron (B), carbon (C), nitrogen (N), oxygen (O), neon (Ne), argon (Ar), krypton (Kr), xenon (Xe) the acceleration voltage of the ions of the beam is between 10 kV and 1000 kV; the treatment temperature of the powder (P) is less than or equal to Tf/3; the ion dose per mass unit of powder to be treated is chosen from a range of between 1016 ions/g and 1022 ions/cm2 so as to lower the reduction temperature of the powder made from cerium oxide (P).
    Type: Application
    Filed: July 24, 2014
    Publication date: July 7, 2016
    Applicant: QUERTECH
    Inventors: Denis Busardo, Frederic Guernalec
  • Publication number: 20160052821
    Abstract: Process for treatment by an ion beam of a glass material where: the acceleration voltage of the ions is between 5 kV and 1000 kV; the temperature of the glass material is less than or equal to the glass transition temperature; the dose of nitrogen (N) or oxygen (O) ions per unit of surface area is chosen within a range of between 1012 ions/cm2 and 1018 ions/cm2 so as to reduce the contact angle of a drop of water below 20°; a prior pretreatment is carried out with argon (Ar), krypton (Kr) or xenon (Xe) ions in order to stengthen the durability of the superhydrophilic treatment. Superhydrophilic glass materials of long duration are thus advantageously obtained.
    Type: Application
    Filed: March 26, 2014
    Publication date: February 25, 2016
    Applicant: QUERTECH
    Inventors: Denis Busardo, Frédéric Guernalec
  • Publication number: 20150376058
    Abstract: A method of treatment using a beam of singly- and multiply-charged gas ions produced by an electron cyclotron resonance (ECR) source of a glass material in which the ion acceleration voltage of between 5 kV and 1000 kV is chosen to create an implanted layer of a thickness equal to a multiple of 100 nm; the ion dose per surface unit in a range of between 1012 ions/cm2 and 1018 ions/cm2 is chosen so as to create an atomic concentration of ions equal to 10% with a level of uncertainty of (+/?)5%. Advantageously this makes it possible to obtain materials made from glass that is non-reflective in the visible range.
    Type: Application
    Filed: February 12, 2014
    Publication date: December 31, 2015
    Applicant: QUERTECH
    Inventors: Denis Busardo, Frederic Guernalec