Patents Assigned to Quorum Technologies Inc.
  • Patent number: 8849006
    Abstract: The disclosure is directed at a system and method for darkfield imaging system and method for automated cell screening of cells. The system and method acquires multi- or hyperspectral digital darkfield images of cells and then processes the images to obtain measurements which can then be supplied or displayed to a user to analyze.
    Type: Grant
    Filed: March 25, 2010
    Date of Patent: September 30, 2014
    Assignee: Quorum Technologies Inc.
    Inventor: John D. Arbuckle
  • Patent number: 8089691
    Abstract: A projection and detector device that attaches externally to the photo-port of a widefield microscope. The device includes a light source interface for receiving of illumination from a light source, the illumination defining an illumination path. A pattern mask is located within the illumination path for projecting one or a plurality of objects, structures, or patterns onto a sample located at the object plane of the optical microscope. The pattern mask may be used with structured illumination microscopy (SIM) to project a moving striped optical grid pattern or Ronchi Ruling onto the sample at the object plane in either fluorescence or reflected brightfield imaging. A mechanical or digital diaphragm may also be used, for techniques such as Fluorescence Recovery After Photobleaching (FRAP), fluorescence photoactivation, and targeted illumination. A computer linked with a charged coupled device (CCD) camera may be used to capture images for storage and further post-processing.
    Type: Grant
    Filed: October 21, 2008
    Date of Patent: January 3, 2012
    Assignee: Quorum Technologies Inc.
    Inventor: John D. Arbuckle
  • Publication number: 20090147354
    Abstract: A projection and detector device that attaches externally to the photo-port of a conventional widefield microscope. The device includes a light source interface for receiving of illumination from a light source, the illumination defining an illumination path. A pattern mask is located within the illumination path for projecting one or a plurality of objects, structures or patterns onto the object plane of the optical microscope. The pattern mask may be used with structured illumination microscopy (SIM) wherein the device projects a moving striped optical grid pattern or Ronchi Ruling onto the object plane in either fluorescence or reflected brightfield imaging. The pattern mask may also be used with a mechanical or digital diaphragm, or a DLP, in specialized techniques such as Fluorescence Recovery After Photobleaching (FRAP), fluorescence photoactivation and targeted illumination. The device without an inserted pattern mask may also be used in deconvolution microscopy.
    Type: Application
    Filed: October 21, 2008
    Publication date: June 11, 2009
    Applicant: QUORUM TECHNOLOGIES INC.
    Inventor: John D. Arbuckle