Patents Assigned to R.D. Offutt Company
  • Dielectric barrier discharge system and method for decomposing hazardous compounds in fluids
    Patent number: 6565716
    Abstract: A dielectric barrier discharge system includes first and second non-thermal plasma reactors which are coupled together in series. The first reactor includes a first surface discharge electrode which defines a first discharge path along the first surface discharge electrode. The second reactor includes second and third electrodes which are separated by a gap and define a second discharge path which extends across the gap. The system can be used to decompose hazardous compounds in a liquid or a gas, such as in power plant flue gases.
    Type: Grant
    Filed: October 17, 2000
    Date of Patent: May 20, 2003
    Assignees: Regents of The University of Minnesota, R.D. Offutt Company
    Inventors: R. Roger Ruan, Paul L. Chen, Anrong Ning, Richard L. Bogaard, Donald G. Robinson, Shaobo Deng, Hongbin Ma, Chuanshuang Bie