Patents Assigned to R.E. Dixon Inc.
  • Gas inlet apparatus and method for chemical vapor deposition reactors
    Patent number: 5888303
    Abstract: A gas inlet apparatus and method for introducing gas streams into the process chamber of a chemical vapor deposition reactor. The inlet includes conduits that are coaxially arranged and spaced radially apart, with the passageways formed therebetween carrying the gas streams. A conical surface is provided at the stream-exiting end of the inlet so that gases impinge upon it and are then dispersed within the reactor.
    Type: Grant
    Filed: April 7, 1997
    Date of Patent: March 30, 1999
    Assignee: R.E. Dixon Inc.
    Inventor: Robert E. Dixon