Patents Assigned to R. Subramanian
  • Ozone cleaning of wafers
    Publication number: 20010010229
    Abstract: In one embodiment, the present invention relates to a method of processing a semiconductor structure, involving the steps of providing the semiconductor structure having a patterned resist thereon; stripping the patterned resist from the semiconductor structure, wherein an amount of carbon containing resist debris remain on the semiconductor structure; and contacting the semiconductor structure with ozone thereby reducing the amount of carbon containing resist debris thereon.
    Type: Application
    Filed: January 31, 2000
    Publication date: August 2, 2001
    Applicant: R. Subramanian
    Inventors: Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Bhanwar Singh, Sanjay K. Yedur, Bryan K. Choo