Abstract: A reactor comprising a plurality of vessels, each having a heat exchange surface for processing a fluid as a thin film flow, the vessels arranged in a concentric manner; a plurality of annular spaces situated between the vessels; and a pathway for directing a heat exchange fluid from one vessel to an adjacent vessel for creating a temperature differential between the heat exchange surfaces and the fluid being processed. A system comprising a fluid source, a reactor, and a vapor outlet and a processed fluid outlet through generated vapor and processed fluid are directed out of the reactor, respectively. A method comprising providing a plurality of concentrically arranged surfaces in spaced relation, distributing a fluid to be processed against the surfaces in a controlled manner to form a substantially uniform thin film flow thereon, and evaporating at least a portion of the fluid being processed along the plurality of surfaces.

Abstract: A system having a reactor for continuous processing of fluid is provided herein. The reactor, in general, includes an outer vessel to accommodate fluids to be processed or used in connection therewith, an inner vessel situated within the outer vessel to serve as an energy exchange surface, and an annular space defined between the outer and inner vessels and along which processing of the fluids can be implemented. The continuous thin film reactor can be used to perform, for example, distillation and evaporation, fluid-fluid or solid-fluid-fluid reactions, organic reactions, cooling, and desalination.