Patents Assigned to R3T GmbH Rapid Reactive Radicals Technology
  • Patent number: 8815746
    Abstract: An apparatus and the use of such an apparatus and method for producing microcomponents with component structures are presented which are generated in a process chamber on a substrate according to the LIGA method for example and are stripped from the enclosing photoresist with the help of a cooled remote plasma source.
    Type: Grant
    Filed: August 30, 2012
    Date of Patent: August 26, 2014
    Assignee: R3T GmbH Rapid Reactive Radicals Technology
    Inventor: Josef Mathuni
  • Publication number: 20120325264
    Abstract: An apparatus and the use of such an apparatus and method for producing microcomponents with component structures are presented which are generated in a process chamber on a substrate according to the LIGA method for example and are stripped from the enclosing photoresist with the help of a cooled remote plasma source.
    Type: Application
    Filed: August 30, 2012
    Publication date: December 27, 2012
    Applicant: R3T GmbH Rapid Reactive Radicals Technology
    Inventor: Josef MATHUNI
  • Patent number: 7665416
    Abstract: An apparatus is described for generating excited and/or ionized particles in a plasma with a generator for generating an electromagnetic wave and an excitation chamber with a plasma zone in which the excited and/or ionized particles are formed. At least one excitation chamber is arranged in an insulating material off-center relative to a ring-cylindrical outer conductor.
    Type: Grant
    Filed: June 12, 2006
    Date of Patent: February 23, 2010
    Assignee: R3T GmbH Rapid Reactive Radicals Technology
    Inventors: Alexander Gschwandtner, Josef Mathuni, Alexander Mattheus, Stephan Schneider, Jürgen Sellmaier, Heinz Steinhardt