Patents Assigned to RAVE N.P., INC.
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Patent number: 10245623Abstract: A substrate dry cleaning apparatus, a substrate dry cleaning system, and a method of cleaning a substrate are disclosed. The substrate dry cleaning system includes a substrate support and a reactive species generator. The reactive species generator includes a first conduit defining a first flow channel that extends to an outlet of the first conduit, the outlet of the first conduit facing the substrate support, a first electrode, a second electrode facing the first electrode, the first flow channel disposed between the first electrode and the second electrode, a first inert wall disposed between the first electrode and the first flow channel, and a second inert wall disposed between the second electrode and the first flow channel.Type: GrantFiled: May 20, 2013Date of Patent: April 2, 2019Assignee: RAVE N.P., INC.Inventors: Gordon Scott Swanson, Ivin Varghese, Mehdi Balooch
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Patent number: 8801504Abstract: A nozzle for providing carbon dioxide for cleaning is disclosed. The nozzle includes a reservoir for receiving liquid carbon dioxide, a barrel defining a passageway therethrough, the passageway extending to an outlet of the barrel, an orifice effecting fluid communication between the reservoir and the passageway, and a screen member constructed and arranged for interrupting flow of the carbon dioxide pellets greater than a select size from being emitted from the passageway of the barrel. Liquid carbon dioxide flows through the orifice to phase transfer into gaseous carbon dioxide and carbon dioxide pellets in the passageway. An internal diameter of the passageway is smaller than an internal diameter of the reservoir.Type: GrantFiled: May 3, 2013Date of Patent: August 12, 2014Assignee: Rave N.P., Inc.Inventors: Charles W. Bowers, Ivin Varghese, Mehdi Balooch
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Patent number: 8568018Abstract: A fluid mixing apparatus and method include a first fluid assembly having at least one fluid nozzle for providing a first fluid; a second fluid assembly having at least one fluid mixing nozzle sized and shaped to be received by the at least one fluid nozzle for providing a second fluid into the first fluid; a mixing region disposed where the at least one fluid nozzle and the at least one fluid mixing nozzle coact in spaced relationship for providing turbulence to the first and second fluids, thereby providing a fluid mixture thereof; and a passageway in communication with the mixing region for expanding the fluid mixture into a different phase.Type: GrantFiled: December 15, 2008Date of Patent: October 29, 2013Assignee: Rave N.P., Inc.Inventors: Steven R. Askin, Charles W. Bowers
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Publication number: 20130244550Abstract: A nozzle for providing carbon dioxide for cleaning is disclosed. The nozzle includes a reservoir for receiving liquid carbon dioxide, a barrel defining a passageway therethrough, the passageway extending to an outlet of the barrel, an orifice effecting fluid communication between the reservoir and the passageway, and a screen member constructed and arranged for interrupting flow of the carbon dioxide pellets greater than a select size from being emitted from the passageway of the barrel. Liquid carbon dioxide flows through the orifice to phase transfer into gaseous carbon dioxide and carbon dioxide pellets in the passageway. An internal diameter of the passageway is smaller than an internal diameter of the reservoir.Type: ApplicationFiled: May 3, 2013Publication date: September 19, 2013Applicant: RAVE N.P., INC.Inventors: Charles W. Bowers, Ivin Varghese, Mehdi Balooch
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Patent number: 8454409Abstract: A nozzle and method of providing CO2 for cleaning includes providing a CO2 flow; phase transferring the CO2 flow into gaseous CO2 and CO2 pellets; interrupting the CO2 flow with a screen member; retaining the CO2 pellets of a select larger size upstream of the screen member; permitting the CO2 pellets of a select smaller size to pass through the screen member for cleaning.Type: GrantFiled: September 10, 2009Date of Patent: June 4, 2013Assignee: Rave N.P., Inc.Inventors: Charles W. Bowers, Ivin Varghese, Mehdi Balooch
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Publication number: 20120279519Abstract: A method for cleaning a substrate having organic and inorganic residues disposed thereon is provided. The method includes removing organic residue from the substrate using atmospheric oxygen plasma, and removing inorganic residue from the substrate using cryogenic CO2. The substrate may be pretreated using a benign cooling agent, and post-treated using a dilute wet chemical cleaning method.Type: ApplicationFiled: October 28, 2011Publication date: November 8, 2012Applicant: RAVE N.P., INC.Inventors: Gordon Scott Swanson, Ivin Varghese, Mehdi Balooch