Patents Assigned to RAVE N.P., INC.
  • Patent number: 10245623
    Abstract: A substrate dry cleaning apparatus, a substrate dry cleaning system, and a method of cleaning a substrate are disclosed. The substrate dry cleaning system includes a substrate support and a reactive species generator. The reactive species generator includes a first conduit defining a first flow channel that extends to an outlet of the first conduit, the outlet of the first conduit facing the substrate support, a first electrode, a second electrode facing the first electrode, the first flow channel disposed between the first electrode and the second electrode, a first inert wall disposed between the first electrode and the first flow channel, and a second inert wall disposed between the second electrode and the first flow channel.
    Type: Grant
    Filed: May 20, 2013
    Date of Patent: April 2, 2019
    Assignee: RAVE N.P., INC.
    Inventors: Gordon Scott Swanson, Ivin Varghese, Mehdi Balooch
  • Patent number: 8801504
    Abstract: A nozzle for providing carbon dioxide for cleaning is disclosed. The nozzle includes a reservoir for receiving liquid carbon dioxide, a barrel defining a passageway therethrough, the passageway extending to an outlet of the barrel, an orifice effecting fluid communication between the reservoir and the passageway, and a screen member constructed and arranged for interrupting flow of the carbon dioxide pellets greater than a select size from being emitted from the passageway of the barrel. Liquid carbon dioxide flows through the orifice to phase transfer into gaseous carbon dioxide and carbon dioxide pellets in the passageway. An internal diameter of the passageway is smaller than an internal diameter of the reservoir.
    Type: Grant
    Filed: May 3, 2013
    Date of Patent: August 12, 2014
    Assignee: Rave N.P., Inc.
    Inventors: Charles W. Bowers, Ivin Varghese, Mehdi Balooch
  • Patent number: 8568018
    Abstract: A fluid mixing apparatus and method include a first fluid assembly having at least one fluid nozzle for providing a first fluid; a second fluid assembly having at least one fluid mixing nozzle sized and shaped to be received by the at least one fluid nozzle for providing a second fluid into the first fluid; a mixing region disposed where the at least one fluid nozzle and the at least one fluid mixing nozzle coact in spaced relationship for providing turbulence to the first and second fluids, thereby providing a fluid mixture thereof; and a passageway in communication with the mixing region for expanding the fluid mixture into a different phase.
    Type: Grant
    Filed: December 15, 2008
    Date of Patent: October 29, 2013
    Assignee: Rave N.P., Inc.
    Inventors: Steven R. Askin, Charles W. Bowers
  • Publication number: 20130244550
    Abstract: A nozzle for providing carbon dioxide for cleaning is disclosed. The nozzle includes a reservoir for receiving liquid carbon dioxide, a barrel defining a passageway therethrough, the passageway extending to an outlet of the barrel, an orifice effecting fluid communication between the reservoir and the passageway, and a screen member constructed and arranged for interrupting flow of the carbon dioxide pellets greater than a select size from being emitted from the passageway of the barrel. Liquid carbon dioxide flows through the orifice to phase transfer into gaseous carbon dioxide and carbon dioxide pellets in the passageway. An internal diameter of the passageway is smaller than an internal diameter of the reservoir.
    Type: Application
    Filed: May 3, 2013
    Publication date: September 19, 2013
    Applicant: RAVE N.P., INC.
    Inventors: Charles W. Bowers, Ivin Varghese, Mehdi Balooch
  • Patent number: 8454409
    Abstract: A nozzle and method of providing CO2 for cleaning includes providing a CO2 flow; phase transferring the CO2 flow into gaseous CO2 and CO2 pellets; interrupting the CO2 flow with a screen member; retaining the CO2 pellets of a select larger size upstream of the screen member; permitting the CO2 pellets of a select smaller size to pass through the screen member for cleaning.
    Type: Grant
    Filed: September 10, 2009
    Date of Patent: June 4, 2013
    Assignee: Rave N.P., Inc.
    Inventors: Charles W. Bowers, Ivin Varghese, Mehdi Balooch
  • Publication number: 20120279519
    Abstract: A method for cleaning a substrate having organic and inorganic residues disposed thereon is provided. The method includes removing organic residue from the substrate using atmospheric oxygen plasma, and removing inorganic residue from the substrate using cryogenic CO2. The substrate may be pretreated using a benign cooling agent, and post-treated using a dilute wet chemical cleaning method.
    Type: Application
    Filed: October 28, 2011
    Publication date: November 8, 2012
    Applicant: RAVE N.P., INC.
    Inventors: Gordon Scott Swanson, Ivin Varghese, Mehdi Balooch