Patents Assigned to RCL Plasma, Inc.
  • Multiple plasma generator hazardous waste processing system
    Patent number: 6817388
    Abstract: A waste processing system is provided herein which entails the use of at least one fixed-position plasma arc generator for primary processing and at least one moveable plasma arc generator for secondary processing assistance and/or final conditioning of the slag prior to exit from the reactor vessel. This optimum processing environment is provided by control of reactor vessel configuration and real time control of processing characteristics to ensure maximum processing efficiency.
    Type: Grant
    Filed: February 11, 2004
    Date of Patent: November 16, 2004
    Assignee: RCL Plasma, Inc.
    Inventors: Andreas V. Tsangaris, George W. Carter, Jesse Z. Shen, D. Michael Feasby, Kenneth C. Campbell