Abstract: A substrate measurement system including a measurement chamber and a substrate handling chamber possessing a substrate transfer and a substrate container interface arranged to receive a substrate to container. The handling chamber contains a first interface to connect the measurement chamber and the measurement chamber contains a second interface to connect the handling chamber. The transfer means is arranged to transfer substrates between the container and the measurement chamber through the handling chamber, in which system a second measurement chamber is provided, having the same second interface as the first measurement chamber to replace latter chamber.
Type:
Grant
Filed:
April 12, 2001
Date of Patent:
April 18, 2006
Assignees:
Nanophotonics AG, Recif SA
Inventors:
Michael Abraham, Ivo J M M Raaijmakers, Alain Gaudon, Pierre Astegno
Abstract: Substrate measurement system including a measurement chamber (30), and a substrate handling chamber (7) possessing substrate transfer means (10) and a substrate container interface (1) arranged to receive a substrate container (8), the handling chamber (7) containing an interface (50) to connect the measurement chamber (30), the measurement chamber (30) containing an interface (51) to connect to the handling chamber (7), and the transfer means (10) being arranged to transfer substrates between the container (8) and the measurement chamber (30) through the handling chamber (7), in which a second measurement chamber (39) is provided, having the same interface (51) as the first measurement chamber (30) to replace the latter chamber (30).
Type:
Grant
Filed:
April 13, 2000
Date of Patent:
July 16, 2002
Assignees:
Nanophotonics AG, Recif SA
Inventors:
Michael Abraham, Ivo J. M. M. Raaijmakers, Alain Gaudon, Pierre Astegno