Patents Assigned to Reflectvity, Inc
  • Patent number: 6913942
    Abstract: A sacrificial layer and a method for applying said sacrificial layer in fabricating microelectromechanical devices are disclosed herein. The sacrificial layer comprises an early transition metal. Specifically, the sacrificial layer comprises an early transition metal element, an early transition metal alloy or an early transition metal silicide.
    Type: Grant
    Filed: March 28, 2003
    Date of Patent: July 5, 2005
    Assignee: Reflectvity, Inc
    Inventors: Satyadev R. Patel, Jonathan C. Doan