Abstract: The present invention relates to methods and apparatuses for the transporting of substantially flat, freely movable objects, wherein at least the holding and guiding takes place by use of a streaming liquid. The apparatus according to the invention comprises at least one treatment surface with at least one inflow region with a multitude of pass-through openings, at least one discharge region for discharging the liquid after provision of the inflow, but no non-fluidic edges, limiters, or other mechanical guiding aids for guiding the flat object. A transport device which bases on the invention can preferably be used within and between treatment plants for flat objects or substrates. Further; a preferably wet chemical treatment can take place simultaneously to the transport, provided that the transport liquid has according characteristics or involves according substances or active agents, respectively.

Abstract: The invention relates to a method for the conditioning of flat objects such as silicon substrates. The objects, obtained by sawing from a block form a comb like structure by being fixed with one edge to a plate shaped fixation apparatus, are conditioned by conventional rinsing, separating and wet chemical treatment, wherein the treatment takes place before the separation of the sawed substrates from the fixation apparatus. An apparatus which is suitable for carrying out the method has two regions arranged parallel to the apparatus longitudinal axis (L) and above one another, wherein the upper region is configured as an adapter region (1). The lower region is formed as a holding region (2) which comprises a part, provided as a channel (11), of a circumferentially closed or closable channel system which can be supplied with liquid by means of closable supply openings (5).

Abstract: The invention relates to the electrical contacting of planar goods 1 in the form of segments in in-line plants for the electrolytic and/or wet chemical treatment of the treatment side 10 of the good by applying electrical external current while keeping the upper contacting side 9 dry and dipping the treatment side 10 into the treatment liquid 11. By use of the known transport systems having upper and lower transport and/or contact means, treatment liquid 11 is transferred from the lower means to the upper ones so that the top side of the good is often inadmissibly wetted and the upper contacts are electroplated, therefore needing to be continuously de-metallized, thus requiring a larger effort. According to the invention, the level is lowered in the region of upper contacts 6. Therefore, the same cannot be wetted, even when no good is present in the region of the contacts 6. This is achieved by means of down pipes 5 which are assigned to each contact 6.

Abstract: An apparatus for the removal of gaseous reaction products (2) from an inline plant (1) for the single sided wet chemical treatment of flat objects (3) by means of a transport gas (G) has an entry (8), a treatment basin (4) for the reception of a treatment liquid (F), an inline transport device (5) with a transport plane (6) for the horizontal transport of the flat objects (3) in transport direction (7), an exit (9), as well as a collection chamber (10) for gaseous reaction products (2) which is arranged above the transport plane (6).

Abstract: The present invention relates to the field of wet chemical treatment of silicon substrates. The invention particularly relates to a method for the determination of the concentration of nitric acid in aqueous process solutions as being used for the treatment of substrates such as those made from silicon. The method is based on the determination of nitrate by means of UV spectroscopy/photometry with the aid of eliminating agents which effectively remove disturbing absorptions caused by other substances. Therein, the concentration of nitrate corresponds to that of nitric acid. According to the invention, a robust method is proposed by means of which the content of nitric acid in acid mixtures can be determined very precisely, and in fact likewise in fresh as well as in acid mixtures that have been used according to their intended purpose.

Abstract: The present invention relates to an apparatus and a method for the fluidic inline-treatment of flat substrates with at least one process module. In particular, the invention relates to such a treatment during the gentle and controlled transport of the substrates, wherein the treatment can also just relate to the transport of the substrates. According to the invention, a process module 1 is provided which comprises a treatment chamber 2 having at least one treatment surface 7A being substantially horizontally arranged in a treatment plane 5 and being designed for the formation of a lower fluid cushion 6A, wherein two openings in the form of entry 3 and exit 4 for the linear feed-through of the substrates 22 in the same plane are assigned to the treatment surface 7A, and at least one feed device with at least one catch 10 for the controlled feed 9 of the substrates 22 within the treatment chamber 2. Furthermore, the invention provides a method using the apparatus according to the invention.

Abstract: The invention relates to a method for etching of silicon surfaces with the following steps: Furnishing an aqueous alkaline hydrocolloid etching solution containing at least one hydrocolloid, at a temperature of 50° C. to 95° C., bringing the silicon surface in contact with the hydrocolloid etching solution for a specified duration, and Removing the hydrocolloid etching solution from the silicon surface.

Abstract: A device for holding a substrate block to be sawed and for flushing the intermediate spaces formed by sawing the substrate block. It comprises two regions arranged parallel to the device longitudinal axis and above one another, the upper region being configured as an adapter region by means of which the device can be connected to a machine instrument, and the lower region being formed as a holding region which comprises a circumferentially closed or closable channel system which can be supplied with flushing liquid by means of closable supply openings and the bottom of which is opened in a slot-like fashion during the sawing of the substrate block so as to provide passage openings for the flushing liquid. A method for flushing intermediate spaces formed by sawing a substrate block using the above device.

Abstract: The invention relates to a separating, deflecting and transporting of a disc like substrate (3) such as e.g. a solar wafer. The apparatus (1) for the separating, deflecting and transporting of disc shaped substrates (3) which are sequentially arranged standing one after another in feed direction in the form of a substrate stack (5) within a liquid, comprises a vertical belt conveyor (9) with at least two conveyor belts (11, 11?), whose conveying span (10) is arranged at one front side (12) of the stack (5) parallel to the front side (12), wherein the belt conveyor (9) has a vacuum device (16) by means of which the respective foremost substrate (3) of the stack (5) can be sucked against at least a first conveyor belt (11), and wherein the at least two conveyor belts (11, 11?) of the vertical belt conveyor (9) are arranged coplanar to each other in the adjoining region.

Abstract: A method and a device for electroplating and electrolytically etching plate-shaped or strip-shaped material in continuous installations or bath installations having rotating transport and contact structures along the conveyor belt. The current is fed to the material in the center, i.e. in the useful zone, thereby obtaining a layer thickness distribution which is at least as good as when the current is supplied from both edges. The invention further allows material of any formats of width and different contours to be electrolytically treated in any order.

Abstract: The invention relates to the continuous cleaning of objects, in particular of semiconductor elements, using ultrasound, wherein the objects to be cleaned are arranged within a liquid. Furthermore, the present invention relates to an apparatus for carrying out the method according to the invention. A basic idea of the invention is that the surface of an object to be cleaned (2) in a tank (5) filled with liquid passes through at least one oscillation maximum that is emitted by at least one sound source (8a) being present in the tank (5). According to one embodiment, the sound source fields (8) that are positioned within the tank (5) are arranged inclined with respect to the transport direction (4).

Abstract: The invention relates to a method for the adjustment of the beam axis of a laser head and an apparatus for this purpose. The method includes the steps of introducing the laser head (3) into a mounting (8), determining the set/actual deviation of the beam axis (2), determining of motions (6A and/or 6B) necessary for reduction of the deviation, and adjustment of the beam axis (2) by driving the adjusting device (4) to generate the adjusting motions (6A and/or 6B), and transmitting the adjusting motions (6A and/or 6B) via the both arms (7A, 7B) of the adjusting lever (7) to the laser head (3) which is arranged in the mounting (8).

Abstract: The present invention relates to methods and apparatuses for the transporting of substantially flat, freely movable objects, wherein at least the holding and guiding takes place by use of a streaming liquid. The apparatus according to the invention comprises at least one treatment surface with at least one inflow region with a multitude of pass-through openings, at least one discharge region for discharging the liquid after provision of the inflow, but no non-fluidic edges, limiters, or other mechanical guiding aids for guiding the flat object. A transport device which bases on the invention can preferably be used within and between treatment plants for flat objects or substrates. Further; a preferably wet chemical treatment can take place simultaneously to the transport, provided that the transport liquid has according characteristics or involves according substances or active agents, respectively.

Abstract: The invention relates to a method for manufacturing a silicon surface with a pyramidal structure, in which a silicon wafer containing the silicon surface is dipped into an etching solution. To produce a pyramidal structure that is as homogeneous as possible, according to the invention it is proposed that the silicon surface be treated with ozone prior to coming into contact with the etching solution.

Abstract: The firing mechanism for a pyrotechnical gas generator in the tightening means of a safety belt restraining system includes a pivotally mounted vehicle-sensitive inertia mass, a spring-loaded pivotally mounted strike piece, a firing pin which is arranged with its free end lying opposite the impact fuse of the gas generator and with its other end lying opposite the strike piece, and a roller blocking mechanism which in the readiness state holds the strike piece at a distance from the opposite end of the firing pin and on vehicle-sensitive pivoting of the inertia mass after over-coming an inhibition threshold releases the strike piece which then under the action of the spring biasing is driven to the oppositely disposed end of the firing pin, strikes the latter and via the firing pin effects firing of the gas generator.