Patents Assigned to RESEARCH & BUSINESS FOUNDATION OF SUNGKYEUNGAM UNIVERSITY
  • METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING SUFFRAGE TREATMENT PROCESS
    Publication number: 20240006190
    Abstract: A method of manufacturing a semiconductor device includes forming a channel layer on a substrate, forming a mask on the channel layer, surface-treating an exposed surface of the channel layer exposed from the mask, forming an electrode on the exposed surface of the channel layer, and removing the mask. The channel layer includes a two-dimensional material, and the surface-treating of the exposed surface of the channel layer includes surface-treating the exposed surface of the channel layer with HCl.
    Type: Application
    Filed: March 6, 2023
    Publication date: January 4, 2024
    Applicants: SAMSUNG ELECTRONICS CO., LTD, RESEARCH & BUSINESS FOUNDATION OF SUNGKYEUNGAM UNIVERSITY
    Inventors: Jin-Hong PARK, Hogeun AHN, BoReum LEE, Sunguk JANG, Jiwan KOO, Seunghwan SEO