Patents Assigned to Research Corporation
  • Patent number: 10337802
    Abstract: Capillary trap-vapor pumps, systems, methods of heat management, and the like, are disclosed.
    Type: Grant
    Filed: October 1, 2014
    Date of Patent: July 2, 2019
    Assignee: Georgia Tech Research Corporation
    Inventor: Andrei G. Fedorov
  • Patent number: 10340127
    Abstract: Systems and methods for determining wafer bias are described. One of the methods includes detecting output of a generator to identify a generator output complex voltage and current (V&I). The generator is coupled to an impedance matching circuit and the impedance matching circuit is coupled to an electrostatic chuck (ESC). The method further includes determining from the generator output complex V&I a projected complex V&I at a point along a path between an output of a model of the impedance matching circuit and a model of the ESC. The operation of determining of the projected complex V&I is performed using a model for at least part of the path. The method includes applying the projected complex V&I as an input to a function to map the projected complex V&I to a wafer bias value at the ESC model.
    Type: Grant
    Filed: October 12, 2016
    Date of Patent: July 2, 2019
    Assignee: Lam Research Corporation
    Inventors: John C. Valcore, Jr., Bradford J. Lyndaker
  • Patent number: 10340121
    Abstract: A plasma processing system for generating plasma to process a wafer. The plasma processing system includes a set of top coils for initiating the plasma, a set of side coils for affecting distribution of the plasma, and a chamber structure for containing the plasma. The chamber structure includes a chamber wall and a dielectric member. The dielectric member includes a top, a vertical wall, and a flange. The top is connected through the vertical wall to the flange, and is connected through the vertical wall and the flange to the chamber wall. The set of top coils is disposed above the top. The set of side coils surrounds the vertical wall. A vertical inner surface of the vertical wall is configured to be exposed to the plasma. The inner diameter of the vertical wall is smaller than the inner diameter of the chamber wall.
    Type: Grant
    Filed: April 6, 2016
    Date of Patent: July 2, 2019
    Assignee: Lam Research Corporation
    Inventors: Maolin Long, Alex Paterson
  • Patent number: 10340171
    Abstract: A substrate support in a substrate processing system includes a baseplate, a ceramic layer, and a bond layer. The ceramic layer is arranged on the baseplate to support a substrate. The bond layer is arranged between the ceramic layer and the baseplate. A seal is arranged between the ceramic layer and the baseplate around an outer perimeter of the bond layer. The seal includes an inner layer formed adjacent to the bond layer and an outer layer formed adjacent to the inner layer such that the inner layer is between the outer layer and the bond layer. The inner layer comprises a first material and the outer layer comprises a second material.
    Type: Grant
    Filed: May 18, 2016
    Date of Patent: July 2, 2019
    Assignee: LAM RESEARCH CORPORATION
    Inventor: Eric A. Pape
  • Patent number: 10340136
    Abstract: A method for defining thin film layers on a surface of a substrate includes exposing the surface of the substrate to a first precursor via a first plasma to allow the first precursor to be absorbed by the surface of the substrate. A second precursor that is different from the first precursor is applied to the surface of the substrate via a second plasma. The second precursor is a Carbon dioxide precursor that releases sufficient oxygen radicals to react with the first precursor to form an oxide film layer on the surface of the substrate.
    Type: Grant
    Filed: July 19, 2018
    Date of Patent: July 2, 2019
    Assignee: Lam Research Corporation
    Inventors: Douglas Walter Agnew, Ishtak Karim
  • Publication number: 20190195206
    Abstract: Various examples related to a deployable gridded ion thruster are described. A deployable gridded ion thruster can include: a thruster body including an ion generating unit; and an expandable discharge chamber configured to expand from a stored configuration to a deployed configuration. The expandable discharge chamber can include a chamber wall having a first geometric shape compressed within the thruster body when in the stored configuration and a second geometric shape expanded outward from the thruster body when in the deployed configuration. Also described herein are methods of operation for a deployable gridded ion thruster.
    Type: Application
    Filed: August 1, 2017
    Publication date: June 27, 2019
    Applicant: Georgia Tech Research Corporation
    Inventors: Mitchell L. R. WALKER, II, Cheong CHAN
  • Publication number: 20190195929
    Abstract: Activity sensing in the home has a variety of important applications, including healthcare, entertainment, home automation, energy monitoring and post-occupancy research studies. Many existing systems for detecting occupant activity require large numbers of sensors, invasive vision systems, or extensive installation procedures. Disclosed is an approach that uses a single plug-in sensor to detect a variety of electrical events throughout the home. This sensor detects the electrical noise on residential power tines created by the abrupt switching of electrical devices and the noise created by certain devices while in operation. Machine learning techniques are used to recognize electrically noisy events such as turning on or off a particular light switch, a television set, or an electric stove. The system has been tested to evaluate system performance over time and in different types of houses. Results indicate that various electrical events can be learned and classified with accuracies ranging from 85-90%.
    Type: Application
    Filed: February 27, 2019
    Publication date: June 27, 2019
    Applicant: Georgia Tech Research Corporation
    Inventors: Shwetak N. Patel, Thomas M. Robertson, Gregory D. Abowd, Matthew S. Reynolds
  • Patent number: 10328688
    Abstract: A dampening fluid useful in offset ink printing applications contains water and a surfactant whose structure can be altered. The alteration in structure aids in reducing accumulation of the surfactant on the surface of an imaging member. The surfactant can be decomposed, switched between cis-trans states, or polymerizable with ink that is subsequently placed on the surface.
    Type: Grant
    Filed: April 25, 2017
    Date of Patent: June 25, 2019
    Assignees: Xerox Corporation, Palo Alto Research Corporation
    Inventors: Naveen Chopra, Peter Gordon Odell, Steven E. Ready, Eric Peeters, Timothy D. Stowe, Ashish Pattekar, David K. Biegelsen
  • Patent number: 10332729
    Abstract: A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power supply boot on an upper surface of a thermal control plate and is located between the thermal control plate and a temperature-controlled top plate. The member is composed of an electrically insulating elastomeric material which can work over a large range of compressions and temperatures.
    Type: Grant
    Filed: February 13, 2018
    Date of Patent: June 25, 2019
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Darrell Ehrlich, Daniel Arthur Brown, Ian Kenworthy
  • Patent number: 10329560
    Abstract: A broad and extensive new category of targets for ribonucleic acids (RNAs) with interference activity (iRNAs), exclusive of the traditional messenger RNA (mRNA) targets have been discovered. iRNAs can be used to manipulate biological processes that do not explicitly involve mRNA and can be directed at non-coding RNAs, such as ribosomal RNAs (rRNAs) and transfer RNAs (tRNAs). iRNA sequences targeted at ribosomal rRNAs and tRNAs have been designed and tested. iRNA that targets a non-coding RNA is called non-coding interfering RNA (nciRNA). nciRNAs cause degradation of non-coding RNAs in vivo, and are highly active in biological assays. nciRNAs can be used as programmed toxins for specific targeting of eukaryotic pathogens and for protection of plants and structures from insects and weeds.
    Type: Grant
    Filed: September 23, 2014
    Date of Patent: June 25, 2019
    Assignee: Georgia Tech Research Corporation
    Inventors: Loren D. Williams, Po-Yu Fang, Chiaolong Hsiao, Justin Williams
  • Patent number: 10329683
    Abstract: Embodiments herein relate to methods, apparatus, and systems for electroplating metal into recessed features using a superconformal fill mechanism that provides relatively faster plating within a feature and relatively slower plating in the field region. Moreover, within the feature, plating occurs faster toward the bottom of the feature compared to the top of the feature. The result is that the feature is filled with metal from the bottom upwards, resulting in a high quality fill without the formation of seams or voids, defects that are likely where a conformal fill mechanism is used. The superconformal fill mechanism relies on the presence of a sacrificial oxidant molecule that is used to develop a differential current efficiency within the feature compared to the field region. Various plating conditions are balanced against one another to ensure that the feature fills from the bottom upwards. No organic plating additives are necessary, though plating additives can be used to improve the process.
    Type: Grant
    Filed: November 3, 2016
    Date of Patent: June 25, 2019
    Assignee: Lam Research Corporation
    Inventors: Lee J. Brogan, Natalia V. Doubina, Matthew A. Rigsby, Jonathan David Reid
  • Patent number: 10332725
    Abstract: A substrate processing tool for processing a substrate includes a processing chamber including a substrate support. First and second coils are arranged outside of the processing chamber. Each of the first and second coils includes first and second conductors. A coil driving circuit drives current through the coils to generate plasma in the processing chamber. A coil reversing circuit is configured to selectively reverse a polarity of current flowing through the first and second conductors of the first coil. The coil reversing circuit includes an H-bridge circuit.
    Type: Grant
    Filed: March 30, 2015
    Date of Patent: June 25, 2019
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Arthur H. Sato, Maolin Long, Alex Paterson
  • Patent number: 10329572
    Abstract: Disclosed herein are novel Pichia pastoris strains for expression of exogenous proteins with substantially homogeneous N-glycans. The strains are genetically engineered to include a mutant OCH1 allele which is transcribed into an mRNA coding for a mutant OCH1 gene product (i.e., ?-1,6-mannosyltransferase, or “OCH1 protein”). The mutant OCH1 protein contains a catalytic domain substantially identical to that of the wild type OCH1 protein, but lacks an N-terminal sequence necessary to target the OCH1 protein to the Golgi apparatus. The strains disclosed herein are robust, stable, and transformable, and the mutant OCH1 allele and the ability to produce substantially homogeneous N-glycans are maintained for generations after rounds of freezing and thawing and after subsequent transformations.
    Type: Grant
    Filed: February 28, 2017
    Date of Patent: June 25, 2019
    Assignee: Research Corporation Technologies, Inc.
    Inventors: Kurt R. Gehlsen, Thomas G. Chappell
  • Patent number: 10332727
    Abstract: A plasma processing method is provided. The method includes receiving a substrate in a substrate support that is configured to be movable along a linear path. The method includes providing at least one process gas into a plasma microchamber. The plasma microchamber is disposed in a processing head having a length that is at least longer than a diameter of the substrate, and said length is perpendicular to said linear path. The method includes generating a plasma in the plasma microchamber by applying power to the plasma microchamber and applying a bias power to the substrate support. The plasma microchamber has an open side process area that is oriented and directed over a surface to be processed, and the open side process area is less than an area of the surface to be processed. The method includes translating said substrate support along said linear path while said microchamber generates the plasma in the plasma microchamber for exposing said plasma over the substrate.
    Type: Grant
    Filed: January 22, 2018
    Date of Patent: June 25, 2019
    Assignee: Lam Research Corporation
    Inventors: Richard Gottscho, Rajinder Dhindsa, Mukund Srinivasan
  • Patent number: 10327661
    Abstract: A method for determining an increased risk of death of a patient includes receiving ECG data of the patient generated during a first time period; receiving EEG data of the patient generated during the first time period; composing a feature of the ECG data and a feature of the EEG data over a common time frame and determining a statistical measure of association between the ECG data and the EEG data; and determining whether the degree of association exceeds a predetermined threshold, thereby indicating whether an increased risk is present.
    Type: Grant
    Filed: July 21, 2015
    Date of Patent: June 25, 2019
    Assignees: Louisiana Tech Research Corporation, Board of Supervisors of Louisiana State University and Agricultural and Mechanical College
    Inventors: Leonidas D. Iasemidis, Ioannis Vlachos, Albert Edward Glasscock
  • Patent number: 10330874
    Abstract: Disclosed are a variety of mixed-signal substrates comprising a plurality of photo-defined through substrate vias and methods of making the same. In an embodiment, a mixed-signal substrate can comprise a plurality of trenches embedded in a substrate, a photodefineable polymer within at least a portion of each trench, the photodefineable polymer defining one or more channels within each of the plurality of trenches, and a conductive material filling at least a portion of the one or more channels within the photodefineable polymer to form one or more through substrate vias. The photo-defined through substrate vias can comprise a variety of arrangements, numbers of vias, shapes, and dimensions across a single substrate.
    Type: Grant
    Filed: February 2, 2017
    Date of Patent: June 25, 2019
    Assignee: Georgia Tech Research Corporation
    Inventors: Paragkumar Thadesar, Muhannad S. Bakir
  • Patent number: 10332778
    Abstract: A substrate lift pin assembly includes a tubular support member connected to a bottom of a pedestal beneath a lift pin through-hole. The tubular support member has an interior cavity and an end closure with a cartridge through-hole extending through the end closure. A cartridge member includes a lift pin holder portion and a plunger portion. The lift pin holder portion is located inside of the interior cavity of the tubular support member. The plunger portion extends through the cartridge through-hole of the end closure of the tubular support member. A lift pin extends through the lift pin through-hole and connects to the lift pin holder portion of the cartridge member. A handle member connects to the plunger portion of the cartridge member at a location near a distal end of the plunger portion relative to the tubular support member. The handle member is configured to engage a lifting mechanism.
    Type: Grant
    Filed: December 21, 2015
    Date of Patent: June 25, 2019
    Assignee: Lam Research Corporation
    Inventors: Erica Pohl, Jeffrey Womack, Lisa Marie Gytri, Michael J. Janicki
  • Patent number: 10333430
    Abstract: A generator for converting mechanical energy or hydropower or wind energy into electrical energy is disclosed. The generator includes a first member and a second member in contact with the first member to generate triboelectric charges. The second member rolls against the first member to generate a flow of electrons between two electrodes. Another embodiment of the generator includes two electrodes, and a member in contact with the two electrodes to generate triboelectric charges. The member rolls against the electrodes to generate a flow of electrons between the two electrodes.
    Type: Grant
    Filed: November 25, 2015
    Date of Patent: June 25, 2019
    Assignee: Georgia Tech Research Corporation
    Inventors: Zhong Lin Wang, Long Lin, Yannan Xie, Zong-Hong Lin, Gang Cheng, Hengyu Guo, Jun Chen
  • Patent number: 10323323
    Abstract: A gas delivery system includes a first valve including an inlet that communicates with a first gas source. A first inlet of a second valve communicates with an outlet of the first valve and a second inlet of the second valve communicates with a second gas source. An inlet of a third valve communicates with a third gas source. A connector includes a first gas channel and a cylinder defining a second gas channel. The cylinder and the first gas channel collectively define a flow channel between an outer surface of the cylinder and an inner surface of the first gas channel. The flow channel communicates with the outlet of the third valve and the first end of the second gas channel. A third gas channel communicates with the second gas channel, with the outlet of the second valve and with a gas distribution device of a processing chamber.
    Type: Grant
    Filed: March 8, 2017
    Date of Patent: June 18, 2019
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Ramesh Chandrasekharan, Jennifer O'Loughlin, Saangrut Sangplung, Shankar Swaminathan, Frank Pasquale, Chloe Baldasseroni, Adrien LaVoie
  • Patent number: 10325760
    Abstract: A system and method monitoring a plasma with an optical sensor to determine the operations of a pulsed RF signal for plasma processing including a plasma chamber with an optical sensor directed toward a plasma region. An RF generator coupled to the plasma chamber through a match circuit. An RF timing system coupled to the RF generator. A system controller is coupled to the plasma chamber, the RF generator, the optical sensor, the RF timing system and the match circuit. The system controller includes a central processing unit, a memory system, a set of RF generator settings and an optical pulsed plasma analyzer coupled to the optical sensor and being capable to determine a timing of a change in state of an optical emission received in the optical sensor and/or a set of amplitude statistics corresponding to an amplitude of the optical emission received in the optical sensor.
    Type: Grant
    Filed: March 28, 2017
    Date of Patent: June 18, 2019
    Assignee: Lam Research Corporation
    Inventors: John C. Valcore, Jr., Tony San, Seonkyung Lee