Patents Assigned to Research In Motion RF, Inc
  • Patent number: 8405563
    Abstract: An embodiment of the present invention an apparatus, comprising an apparatus, comprising an adaptively-tuned antenna including a variable reactance network connected to the antenna, an RF field probe located near the antenna, an RF detector to sense voltage from the field probe, a controller that monitors the RF voltage and supplies control signals to a driver circuit and wherein the driver circuit converts the control signals to bias signals for the variable reactance network.
    Type: Grant
    Filed: February 24, 2012
    Date of Patent: March 26, 2013
    Assignee: Research In Motion RF, Inc.
    Inventors: William E. McKinzie, Keith Manssen, Gregory Mendolia
  • Patent number: 8400752
    Abstract: An embodiment of a tunable capacitor can include a plurality of capacitors connected in series where at least two capacitors of the plurality of capacitors share a common electrode where the at least two capacitors are in lateral proximity and a bias that is capable of being applied to the at least two capacitors whereby the at least two capacitors vibrate in opposite phase to each other when the bias and an RF signal is applied to the at least two capacitors.
    Type: Grant
    Filed: March 23, 2011
    Date of Patent: March 19, 2013
    Assignee: Research In Motion RF, Inc.
    Inventors: James Oakes, James Martin
  • Patent number: 8395459
    Abstract: Methods for generating a look-up table relating a plurality of complex reflection coefficients to a plurality of matched states for a tunable matching network. Typical steps include measuring a plurality of complex reflection coefficients resulting from a plurality of impedance loads while the tunable matching network is in a predetermined state, determining a plurality of matched states for the plurality of impedance loads, with a matched state determined for each of the plurality of impedance loads and providing the determined matched states as a look-up table. A further step is interpolating the measured complex reflection coefficients and the determined matching states into a set of complex reflection coefficients with predetermined step sizes.
    Type: Grant
    Filed: February 29, 2012
    Date of Patent: March 12, 2013
    Assignee: Research In Motion RF, Inc.
    Inventors: John H. Spears, Wayne Smith, Chenggang Sui, Yongfei Zhu
  • Patent number: 8361811
    Abstract: An electronic component is provided on a substrate. A thin-film capacitor is attached to the substrate, the thin-film capacitor includes a pyrochlore or perovskite dielectric layer between a plurality of electrode layers, the electrode layers being formed from a conductive thin-film material. A reactive barrier layer is deposited over the thin-film capacitor. The reactive barrier layer includes an oxide having an element with more than one valence state, wherein the element with more than one valence state has a molar ratio of the molar amount of the element that is in its highest valence state to its total molar amount in the barrier of 50% to 100%. Optionally layers of other materials may intervene between the capacitor and reactive barrier layer. The reactive barrier layer may be paraelectric and the electronic component may be a tunable capacitor.
    Type: Grant
    Filed: December 1, 2008
    Date of Patent: January 29, 2013
    Assignee: Research In Motion RF, Inc.
    Inventors: Marina Zelner, Mircea Capanu, Paul Bun Cheuk Woo, Susan C. Nagy
  • Publication number: 20130011798
    Abstract: An embodiment of the present invention provides a method of applying patterned metallization to a ceramic block comprising applying a photodefinable ink to said ceramic block; drying said ink; exposing said photodefinable ink to UV radiation through a predefined mask according to the thickness of the film to form a pattern; developing said pattern in a developer solution thereby forming a patterned ceramic block; and rinsing, drying and firing said patterned ceramic block.
    Type: Application
    Filed: September 13, 2012
    Publication date: January 10, 2013
    Applicant: RESEARCH IN MOTION RF, INC.
    Inventors: Luna H. Chiu, Chen Zheng, John King, Barry Treadway, George Kang
  • Patent number: 8325097
    Abstract: An embodiment of the present invention is an apparatus, comprising a tunable antenna including a variable reactance network connected to the antenna a closed loop control system adapted to sense the RF voltage across the variable reactance network and adjust the reactance of the network to maximize the RF voltage. The variable reactance network may comprise a parallel capacitance or a series capacitance. Further, the variable reactance networks may be connected to the antenna, which may be a patch antenna, a monopole antenna, or a slot antenna.
    Type: Grant
    Filed: January 16, 2007
    Date of Patent: December 4, 2012
    Assignee: Research In Motion RF, Inc.
    Inventors: William E. McKinzie, III, Keith Manssen, Greg Mendolia
  • Patent number: 8299867
    Abstract: An embodiment of the present invention provides an apparatus, comprising an RF input port, an RF output port connected to the RF input port via a multichip adaptive impedance matching module (AIMM), and the multichip AIMM comprising one or more voltage or current controlled variable reactive elements, wherein the multichip AIMM is adapted to maximize RF power transferred from the at least one RF input port to the at least one RF output port by varying the bias voltage or bias current to the voltage or current controlled variable reactive elements to maximize the RF voltage at the at least one RF output port.
    Type: Grant
    Filed: November 8, 2006
    Date of Patent: October 30, 2012
    Assignee: Research In Motion RF, Inc.
    Inventor: William E. McKinzie, III
  • Patent number: 8283108
    Abstract: An embodiment of the present invention provides a method of applying patterned metallization to a ceramic block comprising applying a photodefinable ink to said ceramic block; drying said ink; exposing said photodefinable ink to UV radiation through a predefined mask according to the thickness of the film to form a pattern; developing said pattern in a developer solution thereby forming a patterned ceramic block; and rinsing, drying and firing said patterned ceramic block.
    Type: Grant
    Filed: March 19, 2007
    Date of Patent: October 9, 2012
    Assignee: Research in Motion RF, Inc.
    Inventors: Luna H. Chiu, Chen Zhang, John King, Barry Treadway, George Kang
  • Patent number: 8269683
    Abstract: An embodiment of the present invention is a method, comprising improving the radiated harmonic distortion of a transmitting antenna system by sensing the RF voltage present on a variable reactance network within the antenna system; controlling the bias signal presented to the variable reactance network; and maximizing the RF voltage present on the variable reactance network.
    Type: Grant
    Filed: May 13, 2009
    Date of Patent: September 18, 2012
    Assignee: Research In Motion RF, Inc.
    Inventors: William E. McKinzie, Greg Mendolia, Keith Manssen
  • Patent number: 8260213
    Abstract: A system that incorporates teachings of the present disclosure may include, for example, a method involving a step to tune a plurality of tunable reactive elements by measuring a drift in reactance of at least one of the plurality of tunable reactive elements away from a desired reactance. Additional embodiments are disclosed.
    Type: Grant
    Filed: September 15, 2009
    Date of Patent: September 4, 2012
    Assignee: Research In Motion RF, Inc
    Inventors: Shamsuddin H. Chasmawala, Matthew R. Greene