Patents Assigned to Reticula Corporation
  • Patent number: 5613013
    Abstract: A system and method is provided for aligning and analyzing multiple images using Glass patterns. A Glass pattern is a Moire-like pattern obtained by superimposing an image on a transformed version of itself. The method includes superimposing the images to produce a first Glass pattern which has a determinable reference point, repositioning at least one of the images to produce a subsequent Glass pattern having a different reference point, and simultaneously aligning the reference points of each of the Glass patterns so as to align the images. The reference points are determined by any of a number of methods including the use of Fourier Transforms. In various embodiments of the invention, information obtained from the nature and quality of the Glass patterns produced is utilized for image analysis without aligning the images.
    Type: Grant
    Filed: May 13, 1994
    Date of Patent: March 18, 1997
    Assignee: Reticula Corporation
    Inventor: Wade Schuette