Patents Assigned to Ricoh Optical Industries Co., Ltd.
  • Publication number: 20140218806
    Abstract: An eyepiece lens system forms a magnified virtual image of an object to be observed, the system including: a first group disposed adjacent to an image display device and having negative refractive power; and a second group disposed adjacent to the first group on a side closer to an eye and having positive refractive power; the first group including a cemented doublet lens of a biconcave lens and a biconvex lens, the second group including two or three positive lenses, being telecentric on the object side. The eyepiece lens system has satisfactory telecentricity on the object side and satisfactorily corrects aberration.
    Type: Application
    Filed: August 22, 2012
    Publication date: August 7, 2014
    Applicants: SONY CORPORATION, RICOH OPTICAL INDUSTRIES, CO., LTD.
    Inventor: Kenichi Ishizuka
  • Patent number: 8641208
    Abstract: Disclosed are a projection display apparatus and a projection optics provided in the projection display apparatus. The projection optics has a refractive optics and a reflective optics. In the refractive optics, a lens (non-circular lens) provided on a reflective optics side has a non-circular shape forming part of an imaginary circular region whose center is an optical axis center of the refractive optics. In other words, the non-circular lens has a shape of a cut-out portion of an imaginary circular lens having an optical axis center coinciding with the optical axis center of the refractive optics.
    Type: Grant
    Filed: April 1, 2011
    Date of Patent: February 4, 2014
    Assignees: Sanyo Electric Co., Ltd., Ricoh Optical Industries Co., Ltd.
    Inventors: Ryuhei Amano, Takashi Ikeda, Kazuhisa Takahashi, Yoshitsugu Kohno, Osamu Nagase
  • Patent number: 8419191
    Abstract: An optical system with short total length to project a high quality large image. The system projects an image onto a projection surface, and includes a lens system having a plurality of lenses, and one or more curved mirrors. Light flux of an enlarged image shooting out from the lens system to the projection surface is incident onto a mirror surface of the one of the curved mirrors first of all. Distances OAL and Y satisfy a requirement 20 <OAL/Y <30. OAL is between the image surface and the surface of the curved mirror nearest the projection surface and along an optical path shared by the most lenses of the lens system, and on the image surface. Y is between the optical axis shared by the most lenses and an edge of the image surface which is farthest from the optical axis shared by the most lenses.
    Type: Grant
    Filed: March 5, 2008
    Date of Patent: April 16, 2013
    Assignee: Ricoh Optical Industries, Co., Ltd.
    Inventors: Osamu Nagase, Yoshitsugu Kono
  • Patent number: 8178010
    Abstract: An optical device having a sub-wavelength grating formed in a specified region is disclosed that is able to prevent wave front degradation accompanying a phase difference of a polarized light beam passing through the optical device. The optical device includes a circular-belt-like region where the sub-wavelength diffraction grating is formed, and a center portion where the sub-wavelength diffraction grating is not formed. A vertically polarized light beam used for operations on a blue-light optical recording medium A has a phase difference in the sub-wavelength diffraction grating to be an integral multiple of 2? and hence is transmitted through the sub-wavelength diffraction grating. A horizontally polarized light beam used for operations on a blue-light optical recording medium is diffracted by the sub-wavelength diffraction grating.
    Type: Grant
    Filed: February 25, 2010
    Date of Patent: May 15, 2012
    Assignees: Ricoh Company, Ltd., Ricoh Optical Industries Co., Ltd.
    Inventors: Hideaki Hirai, Kazuhiro Umeki
  • Patent number: 8087789
    Abstract: A projection optical system includes a first refracting optical system having a plurality of lenses, a first reflecting optical system, and a second reflecting optical system. The first reflecting optical system is disposed on a side of a projection port with respect to an optical axis of the first refracting optical system, and has a positive optical power to reflect light incident through the first refracting optical system in a direction opposite to the side of the projection port. The second reflecting optical system is operable to reflect the light reflected on the first reflecting optical system toward the projection port.
    Type: Grant
    Filed: December 9, 2008
    Date of Patent: January 3, 2012
    Assignees: Sanyo Electric Co., Ltd., Ricoh Optical Industries Co., Ltd.
    Inventors: Ryuhei Amano, Takashi Ikeda, Shinichi Okuno, Osamu Nagase, Yoshitsugu Kohno
  • Publication number: 20110292355
    Abstract: Disclosed are a projection display apparatus and a projection optics provided in the projection display apparatus. The projection optics has a refractive optics and a reflective optics. In the refractive optics, a lens (non-circular lens) provided on a reflective optics side has a non-circular shape forming part of an imaginary circular region whose center is an optical axis center of the refractive optics. In other words, the non-circular lens has a shape of a cut-out portion of an imaginary circular lens having an optical axis center coinciding with the optical axis center of the refractive optics.
    Type: Application
    Filed: April 1, 2011
    Publication date: December 1, 2011
    Applicants: RICOH OPTICAL INDUSTRIES CO., LTD., SANYO ELECTRIC CO., LTD.
    Inventors: Ryuhei AMANO, Takashi IKEDA, Kazuhisa TAKAHASHI, Yoshitsugu KOHNO, Osamu NAGASE
  • Patent number: 8008614
    Abstract: The object of the present invention is to provide a device for detecting with higher sensitivity emission light in the form of fluorescence or phosphorescence emitted from a micro-object irradiated by an excitation light. The present invention provides means for suppressing reflected and scattered light arising from excitation light impinging on the semiconductor detection element of the device, comprising a pinhole formed in a fluorescence collecting microlens, through which the excitation light passes, irradiating the micro-object. The device may also be provided with another means for suppressing reflected and scattered excitation light comprising a non-horizontal surface that is not perpendicular to the excitation light, formed on a part of the light-transparent chip surface from which the excitation light exits.
    Type: Grant
    Filed: June 17, 2009
    Date of Patent: August 30, 2011
    Assignees: National Institute of Advanced Industrial Science and Technology, Ricoh Optical Industries Co., Ltd.
    Inventors: Toshihiro Kamei, Amane Shikanai, Akira Takahashi, Shigeyuki Furuta
  • Publication number: 20100097582
    Abstract: A projection optical system which has a short total length but can project a high quality and large image. The projection optical system projects the displayed image on an image displaying surface onto a projection surface, and includes a lens system having a plurality of lenses, and one or more curved mirrors. Light flux of an enlarged image shooting out from the lens system to the projection surface is incident onto a mirror surface of the one of the curved mirrors first of all. A distance OAL and a distance Y satisfy a requirement (1) 20<OAL/Y<30, OAL being the distance between the image surface and the surface of the curved mirror nearest the projection surface and along an optical path shared by the most lenses of the lens system, and on the image surface, and the distance Y being the distance between the optical axis shared by the most lenses and an edge of the image surface which is farthest from the optical axis shared by the most lenses.
    Type: Application
    Filed: March 5, 2008
    Publication date: April 22, 2010
    Applicant: RICOH OPTICAL INDUSTRIES, CO., LTD
    Inventors: Osamu Nagase, Yoshitsugu Kono
  • Patent number: 7697395
    Abstract: An optical device having a sub-wavelength grating formed in a specified region is disclosed that is able to prevent wave front degradation accompanying a phase difference of a polarized light beam passing through the optical device. The optical device includes a circular-belt-like region where the sub-wavelength diffraction grating is formed, and a center portion where the sub-wavelength diffraction grating is not formed. A vertically polarized light beam used for operations on a blue-light optical recording medium A has a phase difference in the sub-wavelength diffraction grating to be an integral multiple of 2? and hence is transmitted through the sub-wavelength diffraction grating. A horizontally polarized light beam used for operations on a blue-light optical recording medium is diffracted by the sub-wavelength diffraction grating.
    Type: Grant
    Filed: March 1, 2005
    Date of Patent: April 13, 2010
    Assignees: Ricoh Company, Ltd., Ricoh Optical Industries Co., Ltd.
    Inventors: Hideaki Hirai, Kazuhiro Umeki
  • Publication number: 20100038522
    Abstract: The object of the present invention is to provide a device for detecting with higher sensitivity emission light in the form of fluorescence or phosphorescence emitted from a micro-object irradiated by an excitation light. The present invention provides means for suppressing reflected and scattered light arising from excitation light impinging on the semiconductor detection element of the device, comprising a pinhole formed in a fluorescence collecting microlens, through which the excitation light passes, irradiating the micro-object. The device may also be provided with another means for suppressing reflected and scattered excitation light comprising a non-horizontal surface that is not perpendicular to the excitation light, formed on a part of the light-transparent chip surface from which the excitation light exits.
    Type: Application
    Filed: June 17, 2009
    Publication date: February 18, 2010
    Applicants: National Inst of Adv Industrial Sci and Technology, RICOH OPTICAL INDUSTRIES CO., LTD.
    Inventors: Toshihiro KAMEI, Amane Shikanai, Akira Takahashi, Shigeyuki Furuta
  • Publication number: 20090153809
    Abstract: A projection optical system includes a first refracting optical system having a plurality of lenses, a first reflecting optical system, and a second reflecting optical system. The first reflecting optical system is disposed on a side of a projection port with respect to an optical axis of the first refracting optical system, and has a positive optical power to reflect light incident through the first refracting optical system in a direction opposite to the side of the projection port. The second reflecting optical system is operable to reflect the light reflected on the first reflecting optical system toward the projection port.
    Type: Application
    Filed: December 9, 2008
    Publication date: June 18, 2009
    Applicants: SANYO ELECTRIC CO., LTD., RICOH OPTICAL INDUSTRIES CO., LTD.
    Inventors: Ryuhei AMANO, Takashi Ikeda, Shinichi Okuno, Osamu Nagase, Yoshitsugu Kohno
  • Publication number: 20070258058
    Abstract: An optical device includes a main body having a light incident surface, a light emitting surface provided facing the light incident surface, and a light-reflecting side surface provided from a periphery of the light incident surface to a periphery of the light emitting surface. In the optical device, the light incident surface, the light emitting surface and the light-reflecting side surface are mirror-finished, and a supporting portion configured to support the main body is provided on the light-reflecting side surface.
    Type: Application
    Filed: April 10, 2007
    Publication date: November 8, 2007
    Applicants: SANYO ELECTRIC CO., LTD., RICOH OPTICAL INDUSTRIES CO., LTD
    Inventors: Takashi Ikeda, Yoshihiro Yokote, Shinya Matsumoto, Keietsu Sato, Kazutaka Tomite
  • Patent number: 7195732
    Abstract: A method of fabricating a mold and a method of fabricating an article with the mold is disclosed that is capable of fabricating a high three-dimensional surface structure and extending the service life of the mold. A mold having a fine surface shape of a height less than an object height is fabricated, then the fine surface shape of the mold is transferred to an intermediate mold by dry-etching, and then the fine surface shape of the intermediate mold is further transferred to a final article material by dry-etching. In each transfer step by dry-etching, the etching selection ratio is appropriately adjusted to increase the height of the fine surface structure step by step, so that the fine surface shape of the final article material has the object height. On the surface of the final article material, a preliminary pattern of the object surface shape may be formed beforehand to reduce the required thickness of the curable resin.
    Type: Grant
    Filed: September 22, 2003
    Date of Patent: March 27, 2007
    Assignee: Ricoh Optical Industries Co., Ltd.
    Inventor: Kazuhiro Umeki
  • Patent number: 7050238
    Abstract: An optical system includes a plurality of separate light sources with a number M of the light sources arranged in a first direction and a number N of the light sources arranged in a second direction. Each of the light sources has an asymmetric light emission area. The light sources are arranged so that a light beam passing a collimator optical element has a beam width in the first direction greater than a beam width in the second direction. An anamorphic optical element is arranged to have a beam-size reduction rate in the first direction greater than a beam-size reduction rate in the second direction and converts the plurality of light beams from the light sources into a light beam having a symmetric beam cross-section. A light-condensing optical element condenses the light beam having the symmetric beam cross-section into a light receiving element, and the anamorphic optical element includes an array of a number of prisms integrally arranged.
    Type: Grant
    Filed: September 29, 2004
    Date of Patent: May 23, 2006
    Assignee: Ricoh Optical Industries Co., Ltd.
    Inventors: Akira Takahashi, Masaharu Odashima, Shigeru Umeki, Katsuya Kusaka, Hiroaki Takahashi, Hiroyuki Anbe, Ichiroh Oikawa, Mitsuhiro Kudou
  • Publication number: 20040174596
    Abstract: A polarization optical device is disclosed that includes: an inorganic dielectric substrate transparent with respect to incident light having a flat surface; and an array of strips of conductive elements embedded from the flat surface of the inorganic dielectric substrate to a uniform depth, with an equal width, and with an equal separation in a pitch shorter than the wavelength of the incident light in a manner such that the surfaces of the strips of conductive elements are flush with the surface of the substrate.
    Type: Application
    Filed: March 4, 2004
    Publication date: September 9, 2004
    Applicant: RICOH OPTICAL INDUSTRIES CO., LTD.
    Inventor: Kazuhiro Umeki
  • Publication number: 20040135293
    Abstract: A method of fabricating a mold and a method of fabricating an article with the mold is disclosed that is capable of fabricating a high three-dimensional surface structure and extending the service life of the mold. A mold having a fine surface shape of a height less than an object height is fabricated, then the fine surface shape of the mold is transferred to an intermediate mold by dry-etching, and then the fine surface shape of the intermediate mold is further transferred to a final article material by dry-etching. In each transfer step by dry-etching, the etching selection ratio is appropriately adjusted to increase the height of the fine surface structure step by step, so that the fine surface shape of the final article material has the object height. On the surface of the final article material, a preliminary pattern of the object surface shape may be formed beforehand to reduce the required thickness of the curable resin.
    Type: Application
    Filed: September 22, 2003
    Publication date: July 15, 2004
    Applicant: RICOH OPTICAL INDUSTRIES CO., LTD.
    Inventor: Kazuhiro Umeki
  • Patent number: 5830605
    Abstract: To provide a gradation mask which can easily assure distribution of desired exposure intensity.?Means to accomplish the object!A metal and/or metallic compound film 2 (FIG. 1) is uniformly formed on a transparent substrate 1 such that they have a transmittance of 10% or less. An etching mask having a desired pattern is formed on the metal and/or metallic compound film 2. The metal and/or metallic compound film 2 is dry- or wet-etched. The metal and/or metallic compound film 2 is repeatedly subject to patterning and etching steps by using etching masks with different patterns, so that the obtained layers have a thickness Z(X, Y) varying in three or more steps in accordance with desired transmittance.
    Type: Grant
    Filed: August 27, 1996
    Date of Patent: November 3, 1998
    Assignee: Ricoh Optical Industries Co., Ltd.
    Inventors: Kazuhiro Umeki, Shosen Sato, Masaaki Sato
  • Patent number: 5776639
    Abstract: A two-dimensional shape of a dotted pattern and optical densities of dots or sizes of dots having the same optical density are calculated as write data on the basis of a target distribution of transmittance. The dotted pattern is optically written on a photosensitive medium in accordance with the calculated write data, using a beam from a light source whose output is stepwise or sequentially variable. A latent dotted pattern on the photosensitive medium is developed, thereby obtaining an exposure mask having a desired two-dimensional distribution of transmittance expressed by the dotted pattern and the optical densities of dots or the sizes of dots having the same optical density.
    Type: Grant
    Filed: April 8, 1996
    Date of Patent: July 7, 1998
    Assignee: Ricoh Optical Industries, Co., Ltd.
    Inventors: Kazuhiro Umeki, Shosen Sato
  • Patent number: 4720720
    Abstract: A motor-driven film winder for use with a camera includes an exposure inhibit signal generator for generating an exposure inhibit signal when the number of frames to be exposed which is set by an exposure setting unit coincides with the number of exposed frames counted by a counter. The motor-driven film winder also has an unexposed frame indicator for indicating the difference between the number of frames set by the exposure setting unit and the count of the counter as the number of remaining unexposed frames when a shutter release operation of the camera is interrupted before the count of the counter reaches the preset number of frames to be exposed, and an intermittent exposure canceling signal generator for issuing an intermittent exposure cancelling signal to an intermittent exposure signal generator when the preset number of frames to be exposed coincides with the counter of the counter.
    Type: Grant
    Filed: September 18, 1985
    Date of Patent: January 19, 1988
    Assignees: Ricoh Company, Ltd., Ricoh Optical Industries Co., Ltd.
    Inventors: Kunihiko Araki, Tomoya Kitajima, Yoshio Serikawa, Mikio Kobayashi, Hiroshi Terui, Kenji Koyama