Patents Assigned to Rigaku Industrial Corporation
  • Patent number: 6404847
    Abstract: An X-ray analyzing apparatus capable of accomplish a rapid and accurate analysis is provided in which a detector for X-rays is rotated or shuttled to perform a continuous scanning. Determining a counting time for each of fixed scanning intervals by means of a counting time counter 15 and a frequency divider 16, correction of a count for each scanning interval is made by a correction calculating means 11 on the basis of the corresponding counting time.
    Type: Grant
    Filed: September 29, 2000
    Date of Patent: June 11, 2002
    Assignees: Rigaku Industrial Corporation, Rigaku Corporation
    Inventors: Bunjiro Ueki, Toshiyuki Kato, Hideaki Fujimoto
  • Patent number: 6337897
    Abstract: A fluorescent X-ray analyzer includes a detector (6) for detecting fluorescent X-rays (5) emitted from a sample piece (1) to be analyzed, and a first collimator (10) disposed between the sample piece (1) and the detector (6) supported for movement between inserted and retracted positions with respect to a path of travel of the fluorescent X-rays (5) towards the detector (6). The first collimator (10) comprises a wall (11) adjacent the sample piece (1) that is stepped to provide stepped wall segments (11a, 11b, 11c) having respective apertures (12a, 12b, 12c) of varying diameters defined therein. The smaller the aperture, the closer it is to the sample piece (1) when one of the apertures (12a, 12b, 12c) is selected according to a size of a target area of the sample piece (1) to be measured and is then brought in register with the path of travel of the fluorescent X-rays (5) towards the detector (6).
    Type: Grant
    Filed: October 20, 1999
    Date of Patent: January 8, 2002
    Assignee: Rigaku Industrial Corporation
    Inventors: Naoki Kawahara, Kouichi Aoyagi
  • Patent number: 6292532
    Abstract: A fluorescent X-ray analyzing apparatus capable of being used as either a wavelength dispersive type or an energy dispersive type is provided, with which the analysis can be performed quickly and accurately. The fluorescent X-ray analyzing apparatus includes a detecting unit for detecting and analyzing fluorescent X-ray (5) emitted from at least one target area (1a) of a sample (1) to be analyzed as a result of excitation of such target area (1a) with a primary X-ray (3). The detecting unit includes a wavelength dispersive type detecting unit (6) including a spectroscope (8) and a first detector (9), and an energy dispersive type detecting unit (11) including a second detector (12) of an energy dispersive type.
    Type: Grant
    Filed: December 15, 1999
    Date of Patent: September 18, 2001
    Assignee: Rigaku Industrial Corporation
    Inventors: Naoki Kawahara, Takashi Shoji, Takashi Misonoo, Kouichi Aoyagi, Akira Arake, Takashi Sakamoto, Minoru Inoue, Yasujiro Yamada
  • Patent number: 6240159
    Abstract: A fluorescent X-ray analyzer has at least three optical detection paths along which the secondary fluorescent X-ray to be analyzed travels selectively and includes a monochromator (6) carried by a first spindle (14) having a longitudinal axis (O) passing in touch with a light receiving surface of the monochromator (6). A first detector (8A) for measuring the intensity of at least a portion of the secondary X-ray (7) monochromatized by the monochromator (6) while allowing the remaining portion of the secondary X-ray (7) to pass therethrough, and a light receiving slit member (11) for passing the secondary X-ray (7) monochromatized by the monochromator (6) therethrough are carried by a second spindle (17) in side-by-side relation in a circumferential direction. A third spindle (20) is utilized separate from the second spindle (17) for carrying a second detector (8B) for measuring the intensity of the secondary X-ray (7) having passed through the first detector (8A) or the light receiving slit member (11).
    Type: Grant
    Filed: December 7, 1999
    Date of Patent: May 29, 2001
    Assignee: Rigaku Industrial Corporation
    Inventors: Hisayuki Kohno, Shirou Higaki
  • Patent number: 6028911
    Abstract: An X-ray analyzing apparatus includes a drive unit for moving a sample, a plurality of field-limiting slits each having a slit size corresponding to the size of a measuring area of the sample, a selector unit for selectively bringing the field-limiting slits into a path of travel of the secondary X-ray between the sample and the detecting unit, a drive controller for controlling the drive unit to move the sample according to the size of the measuring area of the sample to a position at which the intensity of radiation of a primary X-ray towards the measuring area of the sample attains a maximum value; and a selector controller for controlling the selector unit to render only the secondary X-ray emanating from the measuring area of the sample to be incident upon the detecting unit.
    Type: Grant
    Filed: August 3, 1998
    Date of Patent: February 22, 2000
    Assignee: Rigaku Industrial Corporation
    Inventor: Naoki Kawahara
  • Patent number: 5732120
    Abstract: A fluorescent X-ray analyzing apparatus includes a source of excitation (2) for irradiating a silicon-based sample (S) with primary X-rays (B2) to excite the silicon-based sample (S), a detector (4) for detecting fluorescent X-rays (B5) emitted from the silicon-based sample (S), and an analyzer (6) for analyzing elements contained in the silicon-based sample (S) based on a result of detection performed by the detector (4). The primary X-rays (B2) emitted from the source of excitation (2) have a wavelength higher than, but in the vicinity of a wavelength at an Si--K absorption edge so that generation of fluorescent X-rays (B5) of Si is suppressed to minimize a noise which would occur during detection of fluorescent X-rays (B5) of Na and Al to thereby accomplish an accurate analysis of a minute quantity of NA and Al contained in the sample (S).
    Type: Grant
    Filed: May 19, 1997
    Date of Patent: March 24, 1998
    Assignees: Rigaku Industrial Corporation, Kabushiki Kaisha Toshiba
    Inventors: Takashi Shoji, Tadashi Utaka, Ayako Shimazaki, Kunihiro Miyazaki, Tsuyoshi Matsumura
  • Patent number: 5406609
    Abstract: An X-ray analysis apparatus including an artificial multi-layered grating for rendering X-ray beams to be monochromatic before they are incident on a specimen to be analyzed. This artificial multi-layered grating operates to diffract the X-ray beam, generated from an X-ray radiation source and subsequently impinging on a reflective surface of the artificial multi-layered grating, at a predetermined angle of diffraction to provide the monochromatic X-ray beams. The periodicity of the spacing of lattice planes of the artificial multi-layered grating is so chosen as to be of a value progressively varying along the reflective surface thereof with an increase in distance from the X-ray radiation source. The X-ray analysis apparatus herein disclosed is designed to avoid any possible reduction of the intensity of the X-ray beams which would occur when they are rendered to be monochromatic, and to increase the intensity of the X-ray beams to ensure an improved accuracy in spectroscopic analysis.
    Type: Grant
    Filed: April 9, 1993
    Date of Patent: April 11, 1995
    Assignee: Rigaku Industrial Corporation
    Inventors: Tomoya Arai, Takashi Shoji
  • Patent number: 5132997
    Abstract: An X-ray spectroscopic analyzing apparatus which comprises a source of X-rays, a first analyzing crystal for diffracting the X-rays from the X-ray source, and a second analyzing crystal for diffracting the X-rays from the X-ray source and also for passing therethrough a diffracted X-ray component from the first analyzing crystal. The first and second analyzing crystals are so disposed and so positioned as to permit the diffracted X-ray components of different wavelengths to travel along a single path towards a sample to be analyzed. On an optical path extending between the X-ray source and the sample, a filtering means for cutting a portion of the X-rays which has a wavelength shorter than a predetermined wavelength.
    Type: Grant
    Filed: September 4, 1991
    Date of Patent: July 21, 1992
    Assignee: Rigaku Industrial Corporation
    Inventors: Shinjiro Kojima, Tadashi Utaka
  • Patent number: 4788700
    Abstract: For analyzing the solution specimen according to the fluorescent X-ray analyzing method, a certain quantity of solution specimen to be analyzed is impregnated into a thin porous sheet, for example by dripping method, and the sheet is dried for evaporating the solvent. Held on an appropriate holder, for example, the sheet is placed in the vacuum atmosphere or the atmosphere of helium gas, so that the primary X-rays are irradiated and the wavelength or the intensity of the fluorescent X-rays generated from the solute remained in the sheet may be detected. The concentration of the solution may be changed by concentration or by dilution, so that an adequate intensity of the fluorescent X-ray may be generated. The specimen sampler is made of porous sheet material, to which the solution specimen to be analyzed is impregnated and dried to remain only the solute of the solution in the sheet.
    Type: Grant
    Filed: November 5, 1986
    Date of Patent: November 29, 1988
    Assignees: Rigaku Industrial Corporation, Kawaski Steel Corporation
    Inventors: Shigetoshi Kurozumi, Tadahiro Abe, Hideo Maruyama, Noriko Yasui
  • Patent number: 4271353
    Abstract: An X-ray Spectroscope comprising a pair of soller slits disposed such that one end of each faces an X-ray emitting portion of a sample, a pair of total reflection mirrors disposed such that one end of each face the other end of the respective soller slits and that the reflecting surfaces thereof face each other and make a predetermined angle with respect to X-rays passed through the respective soller slits and an X-ray detector disposed at a position, at which X-rays reflected by the total reflection mirrors intersect each other. If necessary, it further provides a pair of auxiliary soller slits between the X-ray detector and the total reflection mirrors and a filter capable of absorbing only characteristic X-rays from a particular substance.Such an X-ray spectroscope has an extremely improved efficiency of detection compared to the conventional spectroscope of this kind and can also permit size reduction of the entire device.
    Type: Grant
    Filed: June 27, 1979
    Date of Patent: June 2, 1981
    Assignee: Rigaku Industrial Corporation
    Inventors: Nobuo Ohtsuki, Eiji Yamada, Tadashi Utaka
  • Patent number: 4256961
    Abstract: An X-ray spectroscope comprising a soller slit consisting of a number of parallel plates and disposed such that one end thereof faces an X-ray emitting portion of a sample to be analyzed and a plurality of analysing crystals or total reflection mirrors disposed parallel to one another and spaced apart from one another at a suitable interval. The analysing crystals or total reflection mirrors are orientated with their one ends directed to the other end of the soller slit and such that X-rays having passed through the soller slit are incident on them with a desired angle of incidence.Also, these analysing crystals or total reflection mirrors each have a convex back side defined by inclined surfaces respectively parallel with incident and reflected X-rays and facing the reflecting surface of the next adjacent analysing crystal or total reflection mirror.
    Type: Grant
    Filed: June 27, 1979
    Date of Patent: March 17, 1981
    Assignee: Rigaku Industrial Corporation
    Inventors: Takashi Shoji, Tadashi Utaka