Patents Assigned to Rikagaku Kenkyuusyo
  • Patent number: 5166521
    Abstract: An ion source, a first control electrode for controlling an ion beam emitted by the ion source, a detector for detecting scattered particles, and a second control electrode for controlling the ion beam, which is directed from the ion source toward a sample, as well as the scattered particles, are arranged on the same axis along with the sample. The ion beam directed from the ion source toward the sample, and the scattered particles, which are scattered from the sample and are directed toward the detector, are caused to converge. By using an Einzel-type lens as the second control electrode, charged particles and neutral particles constituting the scattered particles are provided with a difference in speed. The detector possesses an anode plate which is divided into the form of concentric, circular plates or concentric arc-shaped plates, and each divided anode plate provides a detection output which contains information relating to a distribution of the scattering angles of the scattered ions.
    Type: Grant
    Filed: November 20, 1991
    Date of Patent: November 24, 1992
    Assignees: Shimadzu Corporation, Rikagaku Kenkyuusyo
    Inventors: Shigeki Hayashi, Sumio Kumashiro, Masakazu Aono, Mitsuhiro Katayama