Patents Assigned to Risk Management Solutions, Inc.
  • Publication number: 20120290334
    Abstract: A variable resolution grid provides a mechanism for focusing specific concentrations of risk exposure on a geographical grid to determine projected loss caused by a particular catastrophe. The geographic grid provides a stable base map by using latitudes and longitudes to define the grid points and cells. Each cell is assigned a geographic identifier or geocode that identifies the location of the cell and its associated resolution. The resolution of the grid may be varied depending in part, on the resolution of any available of hazard data.
    Type: Application
    Filed: July 23, 2012
    Publication date: November 15, 2012
    Applicant: Risk Management Solutions, Inc.
    Inventors: David Carttar, Mohan Sharma, Surya Gunturi, Robert Muir-Wood, Pane Stojanovski
  • Patent number: 8229766
    Abstract: A variable resolution grid provides a mechanism for focusing specific concentrations of risk exposure on a geographical grid to determine projected loss caused by a particular catastrophe. The geographic grid provides a stable base map by using latitudes and longitudes to define the grid points and cells. Each cell is assigned a geographic identifier or geocode that identifies the location of the cell and its associated resolution. The resolution of the grid may be varied depending in part, on the resolution of any available of hazard data.
    Type: Grant
    Filed: August 5, 2004
    Date of Patent: July 24, 2012
    Assignee: Risk Management Solutions, Inc.
    Inventors: David Carttar, Mohan Sharma, Surya Gunturi, Robert Muir-Wood, Pane Stojanovski
  • Publication number: 20100205016
    Abstract: A system and method are provided for identifying exposure concentrations. The process of determining exposure concentrations may include organizing exposure data, defining parameters, determining elevated exposure concentrations, and providing output results. The exposure data may relate to at least geographical locations, policies, accounts, portfolios, treaties, and other exposure data. The parameters may be defined to include at least an area of analysis, a region of interest, a threshold amount, results parameters, and other parameters. The exposure concentration may include at least defining and locating exposure locations using various techniques. The results may be presented using textual, graphical, or other display schemes. The output may be configured to convey information such as positional accuracy of an identified area, exposure accumulation in a defined area, and other information.
    Type: Application
    Filed: April 20, 2010
    Publication date: August 12, 2010
    Applicant: Risk Management Solutions, Inc.
    Inventors: Han Chen, Weimin Dong, Andrew Coburn
  • Patent number: 7707050
    Abstract: A system and method are provided for identifying exposure concentrations. The process of determining exposure concentrations may include organizing exposure data, defining parameters, determining elevated exposure concentrations, and providing output results. The exposure data may relate to at least geographical locations, policies, accounts, portfolios, treaties, and other exposure data. The parameters may be defined to include at least an area of analysis, a region of interest, a threshold amount, results parameters, and other parameters. The exposure concentration may include at least defining and locating exposure locations using various techniques. The results may be presented using textual, graphical, or other display schemes. The output may be configured to convey information such as positional accuracy of an identified area, exposure accumulation in a defined area, and other information.
    Type: Grant
    Filed: March 11, 2004
    Date of Patent: April 27, 2010
    Assignee: Risk Management Solutions, Inc.
    Inventors: Han Chen, Weimin Dong, Andrew Coburn